Phase behavior in thin films of cylinder-forming ABA block copolymers: Mesoscale modeling

Horvat, A.; Lyakhova, K. S.; Sevink, G. J. A.; Zvelindovsky, Andrei; Magerle, R.

doi:10.1063/1.1627325

Cited by 147 publications

(292 citation statements)

References 41 publications

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“…These surface fields extend into the film to about 1.5 microdomain spacing deep and for a cylindrical A 3 B 12 A 3 triblock copolymer with symmetric wetting conditions the surface morphology has been found to change from a half lamellar wetting layer for an A attractive surface to perpendicular cylinders, parallel cylinders, perforated lamellae and finally full lamellae for a more B attractive surface. 18 For very thin films, the effects of both surfaces combine and the transitions occur for weaker surface fields (Fig. 2).…”

Section: 15mentioning

confidence: 99%

Thin films of complexed block copolymers

2009

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Due to their ability to microphase separate into well ordered structures with periodicities on the nanometre scale, block copolymers have received widespread attention as building blocks for the fabrication of nanomaterials. In particular, thin films of block copolymers promise new technological breakthroughs in e.g. computer memory applications. This Review gives a short overview of progress that has been made in preparing suitable thin films of conventional coil-coil diblock copolymer systems, while the advantages as well as the complexities of using more unconventional systems such as triblock copolymers and supramolecular systems are emphasized. Gerrit tenBrinke obtained his PhD in Statistical Physics from the University of Groningen, The Netherlands. He spent two years as a postdoctoral fellow at the University of Massachusetts at Amherst. In 1985 he became Associate Professor in the Polymer Department of the University of Groningen and in 1996 Professor. During 1994-1999 he was also part time Professor at the Helsinki University of Technology working closely together with Olli Ikkala. His research interests are self-assembly in complex polymer systems.

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Section: 15mentioning

confidence: 99%

Thin films of complexed block copolymers

2009

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“…However, the structures that are obtained in this way do not necessarily correspond to the thermodynamic equilibrium morphology of the solvent free films as the solvent adds more factors on which the final microphase-separated structure depends, such as the nature/selectivity of the solvent, 8,[32][33][34][35][36] the solvent evaporation rate, 32,[37][38][39] and the relative solvent vapor pressure. 22,40,41 The effects of these parameters have been observed many times, and although some common behavior in block copolymer thin films has been identified, recently for example Horvat et al were able to predict the behavior in thin films of cylinder-forming ABA block copolymers quite accurately, 17 it is still difficult to foretell the thin film behavior of a specific system.…”

Section: Introductionmentioning

confidence: 99%

“…Besides the pertinent factors applying to ordering in bulk samples, in thin films the interaction of the blocks with the substrate and air interfaces and the film thickness are equally important parameters on which the final microphase-separated structure depends. [17][18][19][20][21][22][23][24][25][26][27] Usually preferential wetting of one of the blocks at an interface leads to a parallel orientation of the microdomains, and when the thickness of the film is incommensurate with the lamellar (or cylindrical/spherical) period, quantization of the film thickness takes place by the formation of terraces. 3,20,[27][28][29] When the interaction with the surface is very strong, a polymer brush may form at the surface.…”

Section: Introductionmentioning

confidence: 99%

Phase Behavior of Solvent Vapor Annealed Thin Films of PS-b-P4VP(PDP) Supramolecules

et al. 2008

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Phase behavior of solvent vapor annealed thin films of PS-b-P4VP(PDP) supramolecules van Zoelen, Wendy; Asumaa, Terhi; Ruokolainen, Janne; Ikkala, OlliI; ten Brinke, Gerrit Take-down policy If you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim.Downloaded from the University of Groningen/UMCG research database (Pure): http://www.rug.nl/research/portal. For technical reasons the number of authors shown on this cover page is limited to 10 maximum. FIN-02015 HUT Espoo, Finland ReceiVed December 13, 2007; ReVised Manuscript ReceiVed February 12, 2008 ABSTRACT: The phase behavior and terrace formation of solvent (chloroform) vapor annealed thin films of asymmetric comb-shaped supramolecules consisting of a polystyrene (PS) block and a supramolecular block of poly(4-vinylpyridine) (P4VP) hydrogen bonded with pentadecylphenol (PDP) on silicon oxide (SiO 2 ) were examined. P4VP(PDP) was found to be present at the SiO 2 interface as well as the air interface, implying symmetric boundary conditions. Because of the inherent change in composition by swelling in a selective solvent, the morphology of a lamellar film could be changed to cylindrical by swelling at different vapor pressures of chloroform vapor. Swelling at a specific vapor pressure at the phase boundary between lamellar and cylindrical resulted in noncommon terrace formation behavior. The lowest terrace consisted of two wetting layers forming one lamella, the second terrace contained perpendicular lamellae, and the highest terrace consisted of parallel P4VP(PDP) cylinders. The results are presented in a morphology diagram as a function of film thickness and composition.

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“…150 °C for 1 minute annealing condition is milder than that for PS-b-PMMA [23]. On the other hand, a suitable BCP thickness for achieving perpendicularly oriented cylinders was reported [24]. PS 271 -b-PMEtOHS 67 formed perpendicularly oriented domain with wider film thickness range, therefore the BCP should be appropriate for forming perpendicular orientation.…”

Section: Orientation Control In Thin Filmmentioning

confidence: 99%

Perpendicularly Oriented Cylinders of Si-containing Block Copolymers by Atmospheric Thermal Annealing

Seshimo¹,

Odashima

Maeda

et al. 2016

J. Photopol. Sci. Technol.

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The directed self-assembly (DSA) of block copolymers (BCPs) can realize as one of candidates for next generation lithography. The BCPs for DSA should exhibit a high resolution, an ability to form perpendicularly oriented domains in the thin film by thermal annealing under mild condition, and a high etching selectivity. Here, we report a new Si-containing BCPs targeted to form perpendicularly oriented cylinders in thin films. The hydroxyl groups in the side chains introduced in the Si-containing block provide a good surface free energy (SFE) balance leading to the perpendicular orientation. Furthermore, this orientation can be completed in only one minute atmospheric thermal annealing at 150 °C. Oxygen plasma etching for the thin films results in the achievement of hexagonally packed cylinders.

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Phase behavior in thin films of cylinder-forming ABA block copolymers: Mesoscale modeling

Cited by 147 publications

References 41 publications

Thin films of complexed block copolymers

Thin films of complexed block copolymers

Phase Behavior of Solvent Vapor Annealed Thin Films of PS-b-P4VP(PDP) Supramolecules

Perpendicularly Oriented Cylinders of Si-containing Block Copolymers by Atmospheric Thermal Annealing

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