The unique structural features of many ternary nitride
materials
with strong chemical bonding and band gaps above 2.0 eV are limited
and are experimentally unexplored. It is important to identify candidate
materials for optoelectronic devices, particularly for light-emitting
diodes (LEDs) and absorbers in tandem photovoltaics. Here, we fabricated
MgSnN2 thin films, as promising II–IV–N2 semiconductors, on stainless-steel, glass, and silicon substrates
via combinatorial radio-frequency magnetron sputtering. The structural
defects of the MgSnN2 films were studied as a function
of the Sn power density, while the Mg and Sn atomic ratios remained
constant. Polycrystalline orthorhombic MgSnN2 was grown
on the (120) orientation within a wide optical band gap range of ∼2.20–2.17
eV. The carrier densities of 2.18× 1020 to 1.02 ×
1021 cm–3, mobilities between 3.75 and
2.24 cm2/Vs, and a decrease in resistivity from 7.64 to
2.73 × 10–3 Ω cm were confirmed by Hall-effect
measurements. These high carrier concentrations suggested that the
optical band gap measurements were affected by a Burstein–Moss
shift. Furthermore, the electrochemical capacitance properties of
the optimal MgSnN2 film exhibited an areal capacitance
of 152.5 mF/cm2 at 10 mV/s with high retention stability.
The experimental and theoretical results showed that MgSnN2 films were effective semiconductor nitrides toward the progression
of solar absorbers and LEDs.