2012
DOI: 10.1063/1.4758991
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Phase-locked loop based on nanoelectromechanical resonant-body field effect transistor

Abstract: Origin of kink effect in AlGaN/GaN high electron mobility transistors: Yellow luminescence and Fe doping Appl. Phys. Lett. 101, 153505 (2012) Poole Frenkel current and Schottky emission in SiN gate dielectric in AlGaN/GaN metal insulator semiconductor heterostructure field effect transistors Appl. Phys. Lett. 101, 153504 (2012) Hybrid vertical transistor based on controlled lateral channel overflow J. Appl. Phys. 112, 074509 (2012) Field-effect diode based on electron-induced Mott transition in NdNiO3 Ap… Show more

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Cited by 24 publications
(13 citation statements)
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“…The steepness of a switch is defined as the minimum gate voltage required for a 10-fold increase in the drain current, known as the subthreshold swing (SS). , The SS cannot be lower than 60 mV/decade at 300 K in a conventional metal oxide semiconductor field-effect transistor (MOSFET) or any device using the carrier injection mechanism over an energy barrier as the operation principle . To overcome the so-called ”Boltzmann Tyranny”, steep switching devices such as tunnel FETs (TFETs), , impact ionization MOSFETs (I-MOSFETs), , nanoelectromechanical field-effect transistors (NEMFETs), , and negative capacitance (NC) MOSFETs with a sub-60 mV/decade swing have been extensively studied. TFETs have attracted much attention for achieving a steep SS value by employing quantum-mechanical band-to-band tunneling (BTBT) of careers from source to the channel .…”
Section: Voltage Pinning Effect In Ferroelectric Gate Stacksmentioning
confidence: 99%
See 1 more Smart Citation
“…The steepness of a switch is defined as the minimum gate voltage required for a 10-fold increase in the drain current, known as the subthreshold swing (SS). , The SS cannot be lower than 60 mV/decade at 300 K in a conventional metal oxide semiconductor field-effect transistor (MOSFET) or any device using the carrier injection mechanism over an energy barrier as the operation principle . To overcome the so-called ”Boltzmann Tyranny”, steep switching devices such as tunnel FETs (TFETs), , impact ionization MOSFETs (I-MOSFETs), , nanoelectromechanical field-effect transistors (NEMFETs), , and negative capacitance (NC) MOSFETs with a sub-60 mV/decade swing have been extensively studied. TFETs have attracted much attention for achieving a steep SS value by employing quantum-mechanical band-to-band tunneling (BTBT) of careers from source to the channel .…”
Section: Voltage Pinning Effect In Ferroelectric Gate Stacksmentioning
confidence: 99%
“…5,6 The SS cannot be lower than 60 mV/decade at 300 K in a conventional metal oxide semiconductor field-effect transistor (MOSFET) or any device using the carrier injection mechanism over an energy barrier as the operation principle. 7 To overcome the so-called "Boltzmann Tyranny", steep switching devices such as tunnel FETs (TFETs), 8,9 impact ionization MOSFETs (I-MOS-FETs), 10,11 nanoelectromechanical field-effect transistors (NEMFETs), 12,13 and negative capacitance (NC) MOS-FETs 14−17 channel. 18 However, the on-current of TFETs is unacceptably low for a technology that would like to replace CMOS.…”
mentioning
confidence: 99%
“…Hence, it is urgent to develop novel prototype devices that can break the thermionic limit of SS to achieve sub-60 mV dec −1 . [3,4] To this end, several steep-slope device systems such as nanoelectromechanical FETs (NEMFETs), [5,6] tunnel FETs (T-FETs), [7,8] Dirac-source FETs (DS-FETs), [9] impact ionization FETs (II-FETs), [10] and negativecapacitance FETs (NC-FETs) [11][12][13][14][15][16][17][18] have been proposed and developed to realize sub-60 mV dec −1 SS potentially. For instance, compared with MOSFET, normal dielectric materials are replaced by ferroelectric/dielectric systems in NC-FETs to achieve low SS below 60 mV dec −1 under the condition of capacitance matching.…”
Section: Doi: 101002/adma202005353mentioning
confidence: 99%
“…Interestingly, this observation holds true from MEMS to CNT resonators, even though dynamic range decreases with device size 27 ; the best linear fits of both experimental stability and thermomechanical limit scale similarly for all device types at ∼ 𝑚 −1 2 ⁄ . The discrepancy has been noted across a large variety of designs and resonating modes: of the 25 datapoints, 6 correspond to flexural mode in clamped-free beams 16,[28][29][30][31][32] , 15 correspond to flexural mode in clamped-clamped beams (3 of which were tensile stressed) 6,11,22,[33][34][35][36][37][38][39][40][41][42][43] , 2 correspond to flexural mode in pinned beams 35,44 , and 2 correspond to flexural mode in thin membranes 45,46 . Similarly, no differences due to transduction techniques, optical detection 22,29,30,32,42,43 , capacitive 40,41,46 , magnetomotive [36][37][38] , piezoelectric 31,44 , piezoresistive 16,34,35,39 or field-effect-modulated conductance…”
Section: Literature Reviewmentioning
confidence: 99%
“…The frequency stability and limit-of-detection for a device are commonly predicted based on the dynamic range (DR) measured [10][11][12] (ratio between maximum driven signal level and noise floor expressed in dB) by applying the simple formula 13,14 , 〈 0 〉 = 1 2 10 − 20 . Additive phase noise generally comes from the device being coupled to a thermal bath.…”
mentioning
confidence: 99%