SPIE Proceedings
 2008
DOI: 10.1117/12.798599
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Phase-shifting photomask repair and repair validation procedure for transparent and opaque defects relevant for the 45nm node and beyond

Christian Ehrlich
1
,
Ute Buttgereit
2
,
Klaus Boehm
3
et al.

Abstract: With the continuing decrease of feature sizes on photomasks and the related rising costs for current and future masks

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