The electrical, optical, and phase change properties of bismuth doped Sb 8 Te 2 films have been characterized. Thin films of the material, with up to 15 at. % percent Bi, have been synthesized; amorphous films were stable at room temperature with a Bi concentration of up to 13 at. %. The effect of Bi on the phase change properties of the film is shown to reduce the crystallization time by an order of magnitude while the crystallization activation energy reduction is minimal; 0.2 eV. Over the last 30 years, 1 phase change materials have been extensively investigated for optical data storage applications. Phase change recording is based on the reversible switching between the crystalline and amorphous states. The rate that data can be erased and directly overwritten is reliant on the crystallization time of the material; thus, understanding the effect of compositional variations on the crystallization times of these materials is of key importance.The effect of Bi doping, in the well researched Ge 2 Sb 2 Te 5 ͑GST͒ phase change alloy, has been reported by a number of groups. [2][3][4] Experimental results demonstrate that the use of Bi as a dopant could play an important role in the demonstration of improved data storage materials. When doped in GST, Bi is known to reduce the transition temperatures without affecting the crystal structure or its lattice parameters.
2In addition to the well known GST composition, the Sb:Te binary compositions are also known phase change materials.
5The appreciation of bismuth's mechanism in Sb:Te compounds could aid the understanding in the somewhat more complex Bi doped ternary systems. The Sb 2 Te phase shows a wide compositional tolerance with Sb content ranging from 63 to 81 at. %. 6 In this work, samples containing 80% Sb have been doped with Bi; close to the maximum Sb concentration at which the Sb 2 Te phase is formed. Since this crystal can form over a wide Sb compositional range, it is anticipated that it will show some acceptance of the Bi atom. The crystallization, optical, and electrical properties have been investigated.The Bi content was varied between 0 and 15 at. % by attaching pure Bi pieces to a Sb 8 Te 2 sputtering target. Sputtering was performed in an argon atmosphere, controlled at 0.5 Pa, with a rf power of 100 W. Films, with thickness of 100 nm, were deposited onto Si and SiO 2 substrates. The film composition was measured by x-ray fluorescence spectroscopy using a Rigaku RIX 2100 system. The crystallization temperature and its activation energy were measured by monitoring the reflection as a function of temperature, using a Linkam microscope furnace in conjunction with a broad visible source and a monochromator-detector setup. Measurements of the crystallization temperature were made at heating rates of 5, 10, 15, 20, and 25°C min −1 in an Ar atmosphere. These heating rates are many orders of magnitude lower than that of laser or joule heating. However, for the purpose of comparing samples measured in the same fashion, these heating rates were deemed suffici...