This study is the first quantitative
synchrotron grazing incidence
X-ray scattering investigation of nanoscale film morphologies of tricyclic
block copolymers based on poly(n-decyl glycidyl ether)
(PDGE) and poly(2-(2-(2-methoxyethoxy)ethoxy)ethyl glycidyl ether)
(PTEGGE) blocks in equivalent volume fractions. Both PDGE and PTEGGE
blocks of the tricyclic block copolymers are amorphous, but copolymers
exhibit phase-separated lamellar nanostructures due to block immiscibility.
The lamellar structures vary in their structural parameters such as
lamellar orientation and structural integrity stability depending
on the degree of topological confinement effect taking effect. Interestingly,
sub-10 nm domain spacings are established by all nanostructures, which
are remarkably shorter than that of the linear analogue. These exceptionally
short domain spacings are evident that the tricyclic block copolymer
approach is highly efficient for developing high-performance nanolithographic
materials for future advanced semiconductor applications.