Phase-Transition Mastering of High-Density Optical Media

Meinders, Erwin R.; Rastogi, Ruchi; Veer, Mark van der; Peeters, Patrick; Majdoubi, Hamid El; Bulle, H.; Millet, Antoine; Bruls, Dominique

doi:10.1143/jjap.46.3987

Cited by 23 publications

(14 citation statements)

References 7 publications

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“…For patterning of the top layer, the PTR-3000 phase transition mastering system (Sony Disc Technology Inc., Tokyo, Japan) was used. The PTR 3000 system was developed for Blu-Ray mastering and uses a 405 nm diode laser for exposure [ 37 ]. Blu-Ray mastering allows high-speed large area writing with resolutions down to 130 nm [ 35 ].…”

Section: Methodsmentioning

confidence: 99%

Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Taus

Prinz²,

Wanzenboeck

et al. 2021

Nanomaterials

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Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

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Section: Methodsmentioning

confidence: 99%

Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Taus

Prinz²,

Wanzenboeck

et al. 2021

Nanomaterials

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“…The inorganic photoresists on the basis of chalcogenide vitreous semiconductors are widely used in manufacturing of stampers for CD replication (PTM technology) [8]. This is bound up with that they have high sensitivity in the ultraviolet wavelength range (200-400 nm) and enable to write down information with short (10-30 ns) laserradiation pulses.…”

Section: Methodsmentioning

confidence: 99%

Application of thin films of chalcogenide vitreous semiconductors in the optical recording systems

Kryuchyn

2011

Phys. Status Solidi C

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For many years thin glasses of chalcogenide vitreous semiconductors were and remain now as one of basic materials of recording media in information carriers for optical information recording systems. To create the first specimens of WORM optical disks the processes of photothermal recording on thin chalcogenide films with a high content of tellurium were widely used. In disk carriers we used 35‐nm thick eutectic Te14Se61Ge15Sb10 alloy films. Information recording was made by (80‐20)‐ns duration pulses. Researches of recorded disks performed in 25 years showed that the shape and sizes of pits were not practically changed, content of oxygen increased insignificantly in a subsurface layer. Thin films of chalcogenide vitreous semiconductors can be considered as promising material for optical carriers suitable for long‐term information storage. As shown by the performed researches, positive inorganic photoresists allow to create relief images with the minimal sizes of 0.15‐0.20 μm at recording radiation at wavelength 405 nm, which enables to make stampers for DVD replication from them. The positive inorganic photoresist films have a sufficiently wide dynamic range. More promising is the use of negative inorganic photoresists that allow to create relief images on nickel substrates, i.e., technology of direct mastering is being realized (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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“…A recognized advantage of optical storage is the low cost mass-production of read-only-memory media [1]. Generally, optical data recording is the process where one or several features of recording medium are changing under the influence of focused laser radiation.…”

Section: Introductionmentioning

confidence: 99%

High-density data recording via laser thermo-lithography and ion-beam etching

Gorbov¹

2014

Semicond. Phys. Quantum Electron. Optoelectron.

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Abstract. Pits 250 -300 -nm wide were obtained on the surface of thin organic nanocomposite film using master-disc laser-burning station with 405 nm laser beam focused by 0.85 NA lens. The film with obtained pits was used as a mask for subsequent reactive ion-beam etching of glass substrate. Finally, 150 -200-nm pits were performed on the substrate surface. Nanocomposite films were based on organic positive photoresist with a dye inclusions. This dye is characterized by wide absorption band within the spectral region 390-410 nm and can be evaporated by laser irradiation with the wavelength 405 nm.

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Phase-Transition Mastering of High-Density Optical Media

Cited by 23 publications

References 7 publications

Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Application of thin films of chalcogenide vitreous semiconductors in the optical recording systems

High-density data recording via laser thermo-lithography and ion-beam etching

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