“…GaN is known to exhibit superior characteristics such as small Auger effects, high radiative recombination rate, high electron mobility, biocompatibility, and a tunable band gap from near-infrared (InN = 0.7 eV) to deep ultraviolet (AlN = 6.12 eV) by alloying it with indium and aluminum, respectively. , Such unprecedented characteristics make GaN a promising material for electrical and optical applications such as high electron mobility transistors, light-emitting diodes (LEDs), photodetectors (PDs), photoanodes, − and piezoelectric nanogenerators. , Conventionally, GaN is grown on a sapphire substrate, which is a thermal and electrical insulator. Such properties hinder sapphire to become the most promising candidate to be used for a high-power device because an extra arrangement would be needed to manage the heat dissipation from the device. − Therefore, a substrate with high thermal conductivity and high electrical resistance is essential to fabricate efficient high-power devices. The materials exhibiting these two divergent properties are beryllium oxide (BeO), diamond, aluminum nitride, silicon carbide, and single-crystal boron nitride.…”