2005
DOI: 10.1063/1.1931055
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Phonon confinement effect of silicon nanowires synthesized by laser ablation

Abstract: A gradual downshift and asymmetric broadening of the Si optical phonon peak were observed by Raman scattering measurements of continuously thermally oxidized silicon nanowires ͑SiNWs͒ synthesized by laser ablation. This downshift and broadening can be interpreted by the phonon confinement effect. Further thermal oxidation produced a reverse change; namely, an upshift of the optical phonon peak. This is considered to be due to compressive stress since this stress was relieved by removing the oxide layers formed… Show more

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Cited by 84 publications
(98 citation statements)
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“…The details of these laser ablation procedures are reported in Ref. 11. SiNWs were directly deposited on a SiO 2 substrate for micro-Raman scattering measurements.…”
mentioning
confidence: 99%
“…The details of these laser ablation procedures are reported in Ref. 11. SiNWs were directly deposited on a SiO 2 substrate for micro-Raman scattering measurements.…”
mentioning
confidence: 99%
“…This can be explained by the increase in the compressive stress toward the center of the SiNWs, arising from the expansion of the surrounding surface oxide layer. 10 The upshift of the Si optical phonon peak of the 1000°C SiNWs was observed from lower oxidation temperatures than that seen in 1200°C SiNWs, as shown in Fig. 5.…”
Section: Compressive Stress and Self-limiting Oxidation In Sinwsmentioning
confidence: 79%
“…The downshift is due to phonon confinement, while the upshift is caused by the increased compressive stress due to the progress of surface oxidation. 10,21 The optical phonon peak of the 1000°C SiNWs before and after thermal oxidation at 700°C showed a lower shift than that seen in 1200°C SiNWs. Furthermore, the upshift of the Si optical phonon peak of the 1000°C SiNWs was observed from lower oxidation temperatures than 1200°C SiNWs.…”
Section: Dependence On Oxidation Temperaturementioning
confidence: 99%
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