While numerous studies have been carried out to characterize heat transport behaviours in various crystalline silicon nanostructures, the corresponding characteristics of amorphous one-dimension system have not been well understood. in this study, we amorphize crystalline silicon by means of helium-ion irradiation, enabling the formation of a completely amorphous region of well-defined length along a single silicon nanowire. Heat conduction across both amorphous region and its crystalline/amorphous interface is characterized by an electron beam heating technique with high measurement spatial resolution. the measured thermal conductivity of the amorphous silicon nanowire appears length-independence with length ranging from ~30 nm to few hundreds nm, revealing the fully diffusons governed heat conduction. Moreover, unlike the size-dependent interfacial thermal conductance at the interface between two one-dimensional crystalline materials, here for the first time, we observe that the interface thermal conductance across the amorphous/crystalline silicon interface is nearly independent of the length of the amorphous region. this unusual independence is further supported by molecular dynamics (MD) simulation in our work. Our results provide experimental and theoretical insight into the nature of interaction between heat carriers in crystalline and amorphous nano-structures and shed new light to design innovative silicon nanowire based devices. While crystalline materials are commonly studied, studying the thermal properties of non-crystalline materials, including all kinds of inorganic, organic, biological materials and their hybrid structures, is equally important, as it can significantly enrich our knowledge of energy transport in non-periodic lattices. Moreover, emergent technologies, like new generations of wearable electronics and soft machines, often exploit non-crystalline materials 1-3. In such materials, the phonon picture fails for atoms arranged in a disordered fashion, where heat is carried in a random channel among series of independent oscillators 4-6. This uncorrelated oscillator picture could be attributed to Einstein, who in 1911 7 predicted the low thermal conductivity limit for a completely amorphous disordered material, namely the "amorphous limit", in which the interactions between random oscillators lead to heat conduction. Since then, this amorphous limit model has been debated in numerous studies, since the values of thermal conductivity of amorphous solids reported were much higher. For amorphous silicon, a ubiquitous component of modern electronic devices, the thermal conductivity based on the calculated amorphous limit is below 2 W/m•K 8. Recent studies have shown that the thermal conductivity of amorphous silicon could be much higher 9,10 and as high as 4-5 W/m•K has been claimed 11. The fact of much higher thermal conductivity than the amorphous limit prediction for amorphous silicon has spurred numerous theoretical calculations to understand how heat carriers transport in amorphous silico...