We have studied solar water splitting with a composite semiconductor electrode, composed of an n-i-p junction amorphous silicon (a-Si, E g 1.7 eV) layer, an indium tin oxide (ITO) layer, and a tungsten trioxide (WO 3 , E g 2.8 eV) particulate layer. The n-i-p a-Si layer, which had more accurately a structure of n-type microcrystalline ( c) 3C-SiC:H (25 nm)/i-type a-Si:H (400 nm)/p-type a-SiC x :H (25 nm), was prepared on a TiO 2 -covered F-doped SnO 2 (FTO)/glass plate by a Hot-Wire CVD method. The ITO layer (100 nm thick) was deposited on the p-type a-Si by the DC magnetron sputtering method, and the WO 3 particulate layer was formed by a doctor-blade method, using a colloidal solution of commercial WO 3 powder of 10-30 nm in diameter. The composite electrode thus prepared was finally heat-treated at 300 C for 1 h. The anodic (water oxidation) photocurrent for the composite electrode in 0.1 M Na 2 SO 4 yielded an IPCE (incident photon to current efficiency) of about 6 % at 400 nm and was stable for more than 24 h. Besides, the onset potential lay a little (by about 0.05 V) more negative than the equilibrium hydrogen evolution potential, indicating a possibility of solar water splitting with no external bias. A preliminary result for the water photooxidation with an "nGaP/p-Si/Pt dot" electrode is also reported briefly.