Photo-induced properties of thin TiO2 films deposited using the radio frequency plasma enhanced chemical vapor deposition method

Adhesion ofE. coliBacteria Cells to Prosthodontic Alloys Surfaces Modified by TiO2Sol-Gel Coatings

“…TiO 2 coatings applied in different conditions may more effectively reduce microorganism adhesion due to their photocatalytic properties which cause the coatings to become bactericidal after ultraviolet radiation [19,20]. The photocatalysis phenomenon might be applied in sterilization of medical instruments as well as during water and air purification [12][13][14][15][16][17][18][19][20][21][22][23]. However, this phenomenon is not significant in case of prosthodontic materials because of the way of their usage.…”

Titanium Oxide Antibacterial Surfaces in Biomedical Devices

“…This technique allows the deposition of thin films of different materials (for example silicon dioxide or silicon nitride) starting from their precursors and operating at lower temperatures due to the plasma action that facilitates the occurrence of the chemical reactions. For example, with regard to the titanium dioxide, Szymanowski et al (98) reported the deposition of TiO 2 onto glass slides and Rashig rings in order to create TiO 2 film having photo-induced antibacterial properties. They used titanium tetrachloride diluted in argon as source of Ti and gaseous O 2 as source of oxygen.…”

Structural, optical and hydrophilic properties of nanocrystalline TiO2 ultra-thin films prepared by pulsed dc reactive magnetron sputtering

“…Because TiO 2 exists in three different crystalline forms, i.e., anatase (tetragonal), rutile (tetragonal), and brookite (orthorhombic), a formation of its phase depends on deposition method, starting material, and deposition temperature. Many methods for preparing the TiO 2 thin films include sol-gel coating [5,6], plasma enhanced chemical vapor deposition [6,7], electron-beam evaporation, [8] and magnetron sputtering [9][10][11]. Among them, a pulsed dc magnetron sputtering method is the most advantageous in controlling the structure and composition of the TiO 2 thin films due to its easiness to adjust deposition condition.…”