2015
DOI: 10.1039/c5cc02997j
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Photo-induced sol–gel processing for low-temperature fabrication of high-performance silsesquioxane membranes for use in molecular separation

Abstract: Silsesquioxane (SQ) membranes derived from 3-methacryloxypropyltrimethoxysilane and bis(trimethoxysilyl)ethane were successfully fabricated at low temperature via photo-induced sol-gel processing. Radical and cationic polymerization of SQ membranes showed high degrees of separation factor and permeance for water/isopropanol separation in pervaporation.

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Cited by 12 publications
(9 citation statements)
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“…The peak areas of the methoxy groups decreased very fast in the rst 15 s and approached a steady value, while simultaneously the peak areas of the silanol groups increased markedly, suggesting that the photo-acid catalyzed hydrolysis of methoxy groups was completed within a very short period of UV irradiation. 17 Aer hydrolysis of the methoxy groups, a subsequent condensation of silanol groups occurred quickly to form the cross-linked structure, as conrmed by the pencil hardness measurement. These results indicate that the photo-induced sol-gel processing initiated by the generation of photo-acid can be used to prepare silsesquioxane thin lms with hard and crosslinked structures within a very short period of UV irradiation without elevating the processing temperature.…”
Section: Resultsmentioning
confidence: 94%
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“…The peak areas of the methoxy groups decreased very fast in the rst 15 s and approached a steady value, while simultaneously the peak areas of the silanol groups increased markedly, suggesting that the photo-acid catalyzed hydrolysis of methoxy groups was completed within a very short period of UV irradiation. 17 Aer hydrolysis of the methoxy groups, a subsequent condensation of silanol groups occurred quickly to form the cross-linked structure, as conrmed by the pencil hardness measurement. These results indicate that the photo-induced sol-gel processing initiated by the generation of photo-acid can be used to prepare silsesquioxane thin lms with hard and crosslinked structures within a very short period of UV irradiation without elevating the processing temperature.…”
Section: Resultsmentioning
confidence: 94%
“…Details of the procedure for sol preparation are described in a previous report. 17 The concentration of the sols was 1.0 wt%, and the molar ratios of BTMSE : H 2 O : AcOH and BTESE : H 2 O : AcOH for sol preparation were 1 : 3 : 0.3 and 1 : 60 : 0.3, respectively. The reaction times for BTMSE-and BTESE-derived sols were 1 and 11 h, respectively.…”
Section: Sol Preparationmentioning
confidence: 99%
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“…Instead of calcination of gels by thermal treatment, a novel approach via photo-induced processing was developed to prepare polymer-supported organosilica membranes at room temperature [46,47]. The effect of UV irradiation on the network formation is important.…”
Section: Pure Organosilica Membranesmentioning
confidence: 99%