Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin: Application to Novel Resin Mold for UV Imprint

Abstract

Several types of photoacid-and photobase-generating monomers were prepared. These monomers were cured with multi-functional acrylate monomers by irradiation at 365 nm. The surface of the cured resin was exposed to 254nm light to generate hydrophilic surface. Water contact angles of the resin surface having acid units (-SO 3 H or -COOH) and amine units (-NH 2 ) were 25~36 o and 38~43 o , respectively, depending on the resin composition. A mold for UV imprint lithography (UV-IL) was prepared using the cured resin with hydrophilic surface. It was shown that the resin mold could be used for UV-IL without surface treatment using demolding agents.