Photoacoustic and microhardness study of structural relaxation in electrodeposited Fe32Ni45P23 amorphous alloys

Gantchev, D.; Kjuchukova, M.; Surnev, S.; Bransalov, K. P.

doi:10.1016/0921-5107(93)90198-v

Cited by 1 publication

(1 citation statement)

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“…However, during the last few years there has been increased interest in PAS as a technique for studying a wide range of material properties such as structural relaxation and thermal diffusivity in amorphous metal alloys, internal cavitations in aluminium based super-plastic alloys, the formation and development of layered structures in glasses and phase diagram determinations etc. It has been possible to examine subsurface cracking and the development of flaws in metal and ceramic materials by combining the scanning technique with photoacoustic spectroscopy [9,10].…”

Section: Introductionmentioning

confidence: 99%

Surface Engineering of CuIn0.75Ga0.25Se2 Thin Films

Ahmed¹,

Ahmed²

2008

JNanoR

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Abstract. In this paper the effects of post-deposition annealing followed by hydrogen ionimplantation on the properties of CuIn 0.75 Ga 0.25 Se 2 thin films have been investigated. The samples were grown by flash evaporation onto glass substrates heated at temperature between room temperature and 200°C. Selected samples were subsequently processed under several sets of conditions, including vacuum, selenium, inert (argon) and forming gas (a 9:1 mixture of N 2 :H 2 ) followed by hydrogen ion-implantation. A high resolution near-infrared photoacoustic spectrometer of the gas-microphone type was used for room temperature analysis of non-radiative defect levels in the as-grown, annealed and hydrogen implanted thin films. The absorption coefficient has been derived from the PA spectra to determine the gap energy and to establish the activation energies for several defect-related energy levels. The changes observed in the PA spectra following annealing and ionimplantation has been directly correlated with the compositional and structural properties of the samples.

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Section: Introductionmentioning

confidence: 99%