1998
DOI: 10.1002/(sici)1521-3773(19981002)37:18<2462::aid-anie2462>3.0.co;2-r
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Photoactivated Preparation and Patterning of Self-Assembled Monolayers with 1-Alkenes and Aldehydes on Silicon Hydride Surfaces

Abstract: Direct lateral patterning in the formation of self-assembled monolayers (SAMs) on silicon was achieved by the photoinduced reaction of aldehydes with Si(111)-H surfaces by using the usual masking techniques (see the schematic illustration; on the right-hand side is a microscopy image of a patterned SAM formed from octadecanal).

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Cited by 251 publications
(300 citation statements)
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“…165,166 Initially reported by Terry et al in a study aimed to provide direct evidence of the silicon-carbon bond formation for the reaction of 1-pentene with Si(111)-H, 146 the UV-mediated hydrosilylation reaction of unsaturated hydrocarbons has since seen numerous applications. [50][51][52]113,133,[167][168][169] The process generally affords good hydrocarbon chain surface coverages, 113,133 chemically stable surfaces, 83 and allows for a straightforward light-addressable surface patterning. 51,52,168 For further details on the early body of work on the photochemical hydrosilylation, the reader should consult the comprehensive reviews of Buriak.…”
Section: Photochemical Hydrosilylation Reactions and Mechanistic Consmentioning
confidence: 99%
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“…165,166 Initially reported by Terry et al in a study aimed to provide direct evidence of the silicon-carbon bond formation for the reaction of 1-pentene with Si(111)-H, 146 the UV-mediated hydrosilylation reaction of unsaturated hydrocarbons has since seen numerous applications. [50][51][52]113,133,[167][168][169] The process generally affords good hydrocarbon chain surface coverages, 113,133 chemically stable surfaces, 83 and allows for a straightforward light-addressable surface patterning. 51,52,168 For further details on the early body of work on the photochemical hydrosilylation, the reader should consult the comprehensive reviews of Buriak.…”
Section: Photochemical Hydrosilylation Reactions and Mechanistic Consmentioning
confidence: 99%
“…[50][51][52]113,133,[167][168][169] The process generally affords good hydrocarbon chain surface coverages, 113,133 chemically stable surfaces, 83 and allows for a straightforward light-addressable surface patterning. 51,52,168 For further details on the early body of work on the photochemical hydrosilylation, the reader should consult the comprehensive reviews of Buriak. 27,28 Here we will mainly focus our discussion on more recent advances, while trying to bring to the attention of the reader the need for conclusive data to resolve the details of the surface hydrosilylation reaction mechanism, both under illumination and thermal conditions.…”
Section: Photochemical Hydrosilylation Reactions and Mechanistic Consmentioning
confidence: 99%
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“…light of < 365 nm) is required. 11,14 Since the visible-light-induced attachment employed here is initiated with photons of significantly less energy, homolytic bond cleavage can be excluded as the starting point for the reaction. Additionally, the 1-decene does not absorb any 447 nm light.…”
mentioning
confidence: 99%