2007
DOI: 10.1134/s1063739707060017
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Photoassisted scanning-probe nanolithography on Ti films

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Cited by 18 publications
(15 citation statements)
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“…Development of the technology of the production of microelectronic and nanoelectronic elements on the basis of metal-oxide nanostructures (ONSs) is connected with the investigation of their properties and the study of the processes of modification of the substrate surface with nanometer resolution [1][2][3][4].…”
Section: Introductionmentioning
confidence: 99%
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“…Development of the technology of the production of microelectronic and nanoelectronic elements on the basis of metal-oxide nanostructures (ONSs) is connected with the investigation of their properties and the study of the processes of modification of the substrate surface with nanometer resolution [1][2][3][4].…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4][5][6]. In addition, titanium oxide was used to fabricate matrices of memristors that offer promise in the production of nonvolatile resistive random-access memory (RRAM) elements with a high-speed response, a small-sized data recording cell, and low power consumption [7,8].…”
Section: Introductionmentioning
confidence: 99%
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“…The use of SPM allows one to study the local geometric, electrical, and mechanical properties of the substrate surface and form nanodimensional structures on the surface of solids [1][2][3][4][5][6]. The resolu tion of SPM methods is defined by many factors, most of which are geomentical properties, specifically, the rounding radius and aspect ratio of the point sides [6].…”
Section: Introductionmentioning
confidence: 99%
“…Local anode oxidation (LAO) monitored by an atomic force micro scope (AFM) is a method alternative to nanolithogra phy, which makes it possible to solve a number of problems in classical methods of formation of nano structures, associated with radiation sources, the com plexity and high cost of lithographic systems, and large time expenditures for technological processes. The LAO method makes it possible to form oxide nano structures (ONSs) on the surface of various materials that can be used in the development and preparation of elements of micro and nanoelectronics, resistive memory, lithographic masks, and catalytic centers of activation and growths of filamented nanostructures [2][3][4][5][6][7]. The ONSs based on TiO 2 are widely used for preparing resistive storage devices [8].…”
Section: Introductionmentioning
confidence: 99%