2021
DOI: 10.1016/j.jece.2020.104631
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Photocatalytic CO2 reduction over g-C3N4 based heterostructures: Recent progress and prospects

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Cited by 85 publications
(28 citation statements)
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“…Also, CNBB maintained the photocatalytic activity after five test cycles in the CO 2 reduction reaction as shown in Figure S5. , The apparent quantum efficiency (AQE) of CN, BiOCl, CNB, and CNBB is then studied as shown in Figure S6. The AQE of CNBB is 0.42% under 400 nm incident monochromatic light and shows the highest solar utilization efficiency in all the samples. …”
Section: Resultsmentioning
confidence: 94%
“…Also, CNBB maintained the photocatalytic activity after five test cycles in the CO 2 reduction reaction as shown in Figure S5. , The apparent quantum efficiency (AQE) of CN, BiOCl, CNB, and CNBB is then studied as shown in Figure S6. The AQE of CNBB is 0.42% under 400 nm incident monochromatic light and shows the highest solar utilization efficiency in all the samples. …”
Section: Resultsmentioning
confidence: 94%
“…As we know, graphite carbon nitride (g-C 3 N 4 ) has received wide attention due to its low cost, suitable band gap, high thermal and chemical stability, and controllable structure and morphology. [15] It has been confirmed that g-C 3 N 4 exhibits excellent performances in the CO 2 reduction, [16] photodegradation of organic pollutants [17] andphotolysis of water to hydrogen. [18] The g-C 3 N 4 material is metal-free layered polymer semiconductorand it has strong visible-light adsorption ability.…”
mentioning
confidence: 84%
“…Due to the immense interest in graphitic carbon nitride‐based catalysts for energy and environmental science, there has been a surge in publications on this topic. There has also been a myriad of reviews based on the utilization of g‐C 3 N 4 for general photocatalytic applications, 47–52 with its participation in the CO 2 RR being the sole discussion for some 53–55 . Based on our previous work on point‐defect engineering of carbon nitrides, 56 the material itself has been found to be an excellent base for further modifications to fine‐tune its surface properties.…”
Section: Introductionmentioning
confidence: 99%