Photocatalytic properties of TiO2 films prepared by O2 cluster ion beam assisted deposition method

Takaoka, Gikan H.; Kawashita, Masakazu; Omoto, Kenichiro; Terada, Takuma

doi:10.1016/j.nimb.2005.03.045

Cited by 12 publications

(11 citation statements)

References 15 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…[13][14][15][16][17] Briefly, neutral beams of O 2 clusters were produced by adiabatic expansion of a high-pressure gas through a glass nozzle into a high vacuum chamber. The O 2 cluster and monomer beams formed were introduced into the ionization and irradiation chamber and ionized by electron bombardment with an ionization voltage of 300 V and an electron current of 300 mA.…”

Section: Experimental 21 Simultaneous Irradiation Of O 2 Cluster Andmentioning

confidence: 99%

“…13 to 1.0j10 16 ionsऄcm ࢬ2 by the simultaneous use of O 2 cluster and monomer ion beams. The acceleration voltage V a for the ion beams was changed from 3 to 10 kV.…”

Section: Experimental 21 Simultaneous Irradiation Of O 2 Cluster Andmentioning

confidence: 99%

“…The cluster ion beams have unique irradiation effects such as high-energydensity deposition, low-damage irradiation etc. [13][14][15][16][17] On the other hand, the monomer ion beams with high-incident energy produce free radicals and bond scission for the irradiated polymer surfaces, which are effective for cross-linking andor caronization.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Apatite Deposition on Polymer Substrates Irradiated by Oxygen Cluster Ion Beams

Kawashita

Shimatani

Itoh

et al. 2006

J. Ceram. Soc. Japan

View full text Add to dashboard Cite

Polyethylene PE and polyethylene terephthalate PET substrates were irradiated by the simultaneous use of oxygen O 2 cluster and monomer ion beams to improve their hydrophilic property. The hydrophilic groups such as COOH and C-OH groups were formed at the PE and PET surfaces by the irradiation. The contact angles of PE and PET substrates were decreased remarkably by the irradiation. Bioactive calcium silicate CS gel layer was successfully formed on the irradiated PE and PET substrates, and the irradiated and CS-coated PE and PET substrates formed uniform bonelike apatite layer on their surfaces in SBF within 4 d.

show abstract

Section: Experimental 21 Simultaneous Irradiation Of O 2 Cluster Andmentioning

confidence: 99%

“…13 to 1.0j10 16 ionsऄcm ࢬ2 by the simultaneous use of O 2 cluster and monomer ion beams. The acceleration voltage V a for the ion beams was changed from 3 to 10 kV.…”

Section: Experimental 21 Simultaneous Irradiation Of O 2 Cluster Andmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Apatite Deposition on Polymer Substrates Irradiated by Oxygen Cluster Ion Beams

Kawashita

Shimatani

Itoh

et al. 2006

J. Ceram. Soc. Japan

View full text Add to dashboard Cite

show abstract

“…For example, for metal and semiconductor materials, surface oxidation is a useful method for passivation and for enhancing the chemical stability of surfaces. In photocatalysis, the functionality of surfaces is enhanced [19,20]. In addition, oxidation of polymeric surfaces enhances the wettability of the surfaces [21], which results in improved cell adhesion to the surfaces.…”

Section: Introductionmentioning

confidence: 99%

Mesenchymal Stem Cell Adhesion on Metal and Polymeric Surfaces Modified by Oxygen Cluster Ion Irradiation

Takaoka

Tsujinaka

Takeuchi

et al. 2014

Trans. Mat. Res. Soc. Japan

View full text Add to dashboard Cite

Polyethylene (PE) and Ti surfaces were irradiated with oxygen cluster ions. For PE surfaces, the sputtered depth increased with an increase in acceleration voltage, and the sputtering yield was approximately 243 molecules per ion at an acceleration voltage of 9 kV. Atomic force microscopy showed that surface roughness increased with an increase in acceleration voltage. The contact angle was between 70° and 80°, which was smaller than that for the unirradiated surface. Adhesion of mesenchymal stem cells (MSCs) could be obtained by adjusting acceleration voltage, although cell adhesion was not observed on the unirradiated surfaces. For Ti surfaces, the surface roughness did not change with cluster ion irradiation. However, the contact angle decreased with an increase in acceleration voltage, and it was 46° at an acceleration voltage of 9 kV. Furthermore, after ultraviolet light irradiation for 30 min, the contact angle decreased to 28°. With regard to cell adhesion, the number of MSCs attached to the Ti surface increased after oxygen cluster ion irradiation.

show abstract

“…The statistical root mean square (rms) roughness for the measured area (500 nm × 500 nm) was 0.42 nm, which indicates that the extremely flat surface of the TiO 2 film was obtained by the DCSD-induced plasma CVD process. Such high surface uniformity could only be observed in the films derived from O 2 cluster ion beam-assisted deposition, [10] plasma-enhanced atomic layer deposition (PEALD), [11] or sol-gel method using a titanium naphthenate precursor.[12] The fractured cross-section of the TiO 2 …”

mentioning

confidence: 99%

Crystalline, Uniform‐Sized TiO₂ Nanosphere Films by a Novel Plasma CVD Process at Atmospheric Pressure and Room Temperature

Zhu

Nie

et al. 2007

Chemical Vapor Deposition

View full text Add to dashboard Cite

TiO 2 films play an important role in extensive applications such as photocatalysis, photovoltaics, biocompatibility, and sanitary disinfection. [1,2] Low-temperature film fabrication processes are essential for all thermally sensitive or unstable substrate materials such as organic polymers and textiles. Plasma CVD is highly suitable for low-temperature fabrication, but it has mainly been low pressure incorporated with sophisticated discharge and vacuum systems that have been adopted. [3][4][5] Recently, a diffuse coplanar surface discharge (DCSD) for generating thin-layer plasma has brought new opportunities for plasma CVD under atmospheric pressure and at room temperature. [6][7][8] Here we report, for the first time, a DCSD-induced plasma CVD route for nanocrystal TiO 2 thin-film fabrication under atmospheric pressure and at room temperature. Using this simple, robust, low-cost, and fast deposition approach, the as-deposited TiO 2 films composed of uniform-size nanospheres with preferential anatase formation show quite smooth, uniform, and transparent characteristics, good adhesion onto the substrate, and photocatalytic activity. The TiO 2 thin films were successfully fabricated by the DCSD-induced plasma CVD using 28 kV peak-to-peak voltage and 5 min deposition time under atmospheric pressure and at room temperature (see Fig. 1a). The waveforms of applied voltage and current for TiO 2 film deposition are shown in Figure 1b. The electric discharge power, 1.4 W, was measured via the area of the voltage/charge Lissajous figures.[9] The temperature of the plasma layer, determined by a colored-alcohol thermometer, was very close to room temperature (see Fig. 1c).The as-deposited TiO 2 films show a rather smooth and uniform surface without cracks, particulates, or other defects (see the overview scanning electron microscopy (SEM) image at low magnification, Fig. 2a). From Figure 2b, it can be further observed that the as-deposited films were almost exclusively composed of closely packed nanospheres, about 20-25 nm in diameter, without the formation of larger agglomerations. Moreover, the higher magnification SEM image in Figure 2b shows that TiO 2 nanoparticles are quite uniform in size and shape, and well interconnected. Figure 2c reveals the 3-dimensional atomic force microscopy (AFM) images of the as-deposited TiO 2 film. The statistical root mean square (rms) roughness for the measured area (500 nm × 500 nm) was 0.42 nm, which indicates that the extremely flat surface of the TiO 2 film was obtained by the DCSD-induced plasma CVD process. Such high surface uniformity could only be observed in the films derived from O 2 cluster ion beam-assisted deposition, [10] plasma-enhanced atomic layer deposition (PEALD), [11] or sol-gel method using a titanium naphthenate precursor.[12] The fractured cross-section of the TiO 2

show abstract

Photocatalytic properties of TiO2 films prepared by O2 cluster ion beam assisted deposition method

Cited by 12 publications

References 15 publications

Apatite Deposition on Polymer Substrates Irradiated by Oxygen Cluster Ion Beams

Apatite Deposition on Polymer Substrates Irradiated by Oxygen Cluster Ion Beams

Mesenchymal Stem Cell Adhesion on Metal and Polymeric Surfaces Modified by Oxygen Cluster Ion Irradiation

Crystalline, Uniform‐Sized TiO₂ Nanosphere Films by a Novel Plasma CVD Process at Atmospheric Pressure and Room Temperature

Contact Info

Product

Resources

About

Photocatalytic properties of TiO2 films prepared by O2 cluster ion beam assisted deposition method

Cited by 12 publications

References 15 publications

Apatite Deposition on Polymer Substrates Irradiated by Oxygen Cluster Ion Beams

Apatite Deposition on Polymer Substrates Irradiated by Oxygen Cluster Ion Beams

Mesenchymal Stem Cell Adhesion on Metal and Polymeric Surfaces Modified by Oxygen Cluster Ion Irradiation

Crystalline, Uniform‐Sized TiO2 Nanosphere Films by a Novel Plasma CVD Process at Atmospheric Pressure and Room Temperature

Contact Info

Product

Resources

About

Crystalline, Uniform‐Sized TiO₂ Nanosphere Films by a Novel Plasma CVD Process at Atmospheric Pressure and Room Temperature