Photochemical generation and deposition of copper from a gas phase precursor

Jones, Carol R.; Houle, Frances A.; Kovac, C. A.; Baum, Thomas H.

doi:10.1063/1.95811

Cited by 71 publications

(14 citation statements)

References 21 publications

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“…Stud- ies of the average composition of copper-carbon films deposted over a range of incident light intensities have shown that a major source of carbon is decomposition of the ligands and incorporation of the products into the growing film. 9 The percentage of carbon increases with decreasing light intensity in the power-density regime used for these experiments. The microscopic and macroscopic composition variations observed indicate that copper-rich regions coincide with electromagnetic-field maxima at the surface.…”

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confidence: 84%

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Composition, Structure, and Electric Field Variations in Photodeposition

1985

Phys. Rev. Lett.

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Copper-carbon films formed by photodeposition from a vapor-phase copper-organic compound by use of a cw ultraviolet laser beam exhibit periodic ripple structures associated with surface waves. Microscopic analysis of these films shows that composition and order also vary periodically and change abruptly on dimensional scales small compared to optical wavelengths. A simple model including strongly varying fields appropriate to the film corrugation is proposed to explain these unusual features. PACS numbers: 68.55. + b, 71.45.Gm, 78.65.EzThe formation of periodic structures, or ripples, on surfaces exposed to laser radiation has been observed for optically damaged surfaces 1 " 5 and photochemically deposited films. 6,7 Although it is generally agreed that ripple formation involves scattering of the incident beam into surface waves, the details of how the surface electromagnetic waves actually effect changes in the photodeposition process have only been explored for the (CH 3 ) 2 Cd system. 6 " 8 In this Letter we present data showing that the processes involved in ripple formation during metal photodeposition are more general and can exhibit far richer detail than previously suggested. Our films show novel properties, including periodicity in composition and crystallinity, in addition to the topographic variations described by others.The photodeposited films studies were grown by photolysis of (Cu il) (1,1,1,5,5,5, -hexafluoropentanedione) 2 (ethanol). 9 Solid samples of this compound were introduced into a stainless-steel vacuum cell which was subsequently evacuated to the vapor pressure ( -10 ixm) of the solid. A cw beam at 257 nm, obtained from a doubled argon-ion laser, was focused to a 10-/u,m-diam spot at nominal power densities of (1-2) xlO 4 W/cm 2 . Under these conditions photodeposition is primarily due to photolysis of molecules at or near the substrate surface. Films of varying thickness have been deposited on native oxide-covered silicon wafers and carbon-coated cleaved mica by use of growth times ranging from 5 to 30 min. Films grown with use of a 514-nm light at intensities where substrate heating is important show no ripple structure and are composed of high-purity copper crystallites. 10

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confidence: 84%

“…9 Solid samples of this compound were introduced into a stainless-steel vacuum cell which was subsequently evacuated to the vapor pressure ( -10 ixm) of the solid. A cw beam at 257 nm, obtained from a doubled argon-ion laser, was focused to a 10-/u,m-diam spot at nominal power densities of (1-2) xlO 4 W/cm 2 .…”

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confidence: 99%

Composition, Structure, and Electric Field Variations in Photodeposition

1985

Phys. Rev. Lett.

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“…There are publications that demonstrate the feasibility of such processes for Al [22], Cu [23][24][25][26], and Au [27,28]. It is anticipated that these processes will develop rapidly in the future.…”

Section: Individual Processesmentioning

confidence: 99%

On-chip wiring for VLSI: Status and directions

Small

Pearson

1990

IBM J. Res. & Dev.

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“…For example, the complexes Cu(acac) 2 [62][63][64][65][66][67] and Ru(acac) 3 [30] are reduced by hydrogen under CVD conditions to give metal films, but the ruthenium deposit was shown to contain appreciable amounts of Ru0 2 . The rhodium acac complex Rh(CO) 2 (acac) has been shown to give rhodium metal under plasma CVD conditions [68].…”

Section: Carbonylsmentioning

confidence: 99%

Low Temperature MoCVD Routes to Thin Films from Transition Metal Precursors

Girolami

Gozum

1989

MRS Proc.

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A review is presented of early and recent advances in the metal-organic chemical vapor deposition (MOCVD) of thin films from organotransition metal and related precursors. Routes to pure metals and alloys, metal carbides, metal borides, metal nitrides, metal silicides, and related materials will be summarized. Also included is a discussion of both the advantages and disadvantages of employing metal-organic precursors that contain transition elements.

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Photochemical generation and deposition of copper from a gas phase precursor

Abstract: The photochemical generation and deposition of copper metal from a volatile copper coordination complex are described. Pulsed and cw ultraviolet light sources were used to induce deposition. The chemical compositions of the films are compared for all methods.

Cited by 71 publications

References 21 publications

Composition, Structure, and Electric Field Variations in Photodeposition

Composition, Structure, and Electric Field Variations in Photodeposition

On-chip wiring for VLSI: Status and directions

Low Temperature MoCVD Routes to Thin Films from Transition Metal Precursors

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