Photochemical removal of NO2 by using 172-nm Xe2 excimer lamp in N2 or air at atmospheric pressure

Tsuji, Masaharu; Kawahara, Masashi; Noda, K.; Senda, Makoto; Sako, Hiroshi; Kamo, N.; Kawahara, Takashi; Kamarudin, Khairul Anuar

doi:10.1016/j.jhazmat.2008.05.136

Cited by 20 publications

(25 citation statements)

References 30 publications

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“…Light-induced advanced oxidation processes have demonstrated good development prospects in the area of emission reduction of NO x and SO 2 from flue gas. ,,,,,− Several semiconductor-based photocatalytic oxidation processes have been developed for removal of NO x and SO 2 from flue gas and have exhibited good removal performance for NO x and SO 2 . ,− However, some drawbacks, such as instability and low activity of photocatalyst, low penetration of UV light in solids, and restriction of low concentrations of pollutants (photocatalytic oxidation processes can be only used for the treatment of pollutants with low concentration), hinder their industrial applications. , In recent years, several photochemical oxidation processes, such as dry VUV radiation, ,− wet UV–H 2 O 2 ,, and wet UV–Fenton(-like) processes, ,, have been developed to remove NO x and SO 2 from flue gas. Tsuji et al − successfully used 172 nm Xe 2 and 146 nm Kr 2 excimer lamps as VUV sources to remove SO 2 , NO, and NO 2 in N 2 and air without using any expensive catalysts, which shows that VUV is an effective light source for the removal of SO 2 , NO, and NO 2 . However, Tsuji’s studies − did not consider the effect of VUV irradiation in the simultaneous presence of O 2 and H 2 O, which are the two main components of actual flue gases.…”

Section: Introductionmentioning

confidence: 99%

Novel Process of Simultaneous Removal of Nitric Oxide and Sulfur Dioxide Using a Vacuum Ultraviolet (VUV)-Activated O₂/H₂O/H₂O₂ System in A Wet VUV–Spraying Reactor

Liu

Wang

Pan

2016

Environ. Sci. Technol.

159

116

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A novel process for NO and SO simultaneous removal using a vacuum ultraviolet (VUV, with 185 nm wavelength)-activated O/HO/HO system in a wet VUV-spraying reactor was developed. The influence of different process variables on NO and SO removal was evaluated. Active species (O and ·OH) and liquid products (SO, NO, SO, and NO) were analyzed. The chemistry and routes of NO and SO removal were investigated. The oxidation removal system exhibits excellent simultaneous removal capacity for NO and SO, and a maximum removal of 96.8% for NO and complete SO removal were obtained under optimized conditions. SO reaches 100% removal efficiency under most of test conditions. NO removal is obviously affected by several process variables. Increasing VUV power, HO concentration, solution pH, liquid-to-gas ratio, and O concentration greatly enhances NO removal. Increasing NO and SO concentration obviously reduces NO removal. Temperature has a dual impact on NO removal, which has an optimal temperature of 318 K. Sulfuric acid and nitric acid are the main removal products of NO and SO. NO removals by oxidation of O, O·, and ·OH are the primary routes. NO removals by HO oxidation and VUV photolysis are the complementary routes. A potential scaled-up removal process was also proposed initially.

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Section: Introductionmentioning

confidence: 99%

Novel Process of Simultaneous Removal of Nitric Oxide and Sulfur Dioxide Using a Vacuum Ultraviolet (VUV)-Activated O₂/H₂O/H₂O₂ System in A Wet VUV–Spraying Reactor

Liu

Wang

Pan

2016

Environ. Sci. Technol.

159

116

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“…Some researchers have inferred that VUV light irradiation may directly decompose SO 2 and NO by oxidation removal reactions . This assumption was verified by the experimental results of Tsuji, where they found the deposition of sulfur powders on the walls of the reaction chamber after photolysis of SO 2 in N 2 under VUV irradiation.…”

Section: Methodsmentioning

confidence: 76%

{normalSO}_{2} + normalh υ \overset{((), λ < 200 normalnm)}{\to} S + O_{2} \cdot

{normalSO}_{2} + normalh υ \overset{((), λ < 200 normalnm)}{\to} SO + \cdot O

SO + normalh υ \overset{((), λ < 200 normalnm)}{\to} S + \cdot O

NO + normalh υ \overset{((), λ < 200 normalnm)}{\to} N \cdot + \cdot O

N \cdot + N \cdot \to N_{2}

\cdot O + \cdot O \to O_{2}

…”

Section: Methodsmentioning

confidence: 99%

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Effects of experimental parameters on simultaneous removal of SO₂ and NO by VUV/H₂O₂ advanced oxidation process in a pilot‐scale photochemical spraying tower

Xie

Zhang

et al. 2018

J of Chemical Tech & Biotech

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BACKGROUND: Emissions of SO 2 and NO from flue gas have caused serious environmental pollution issues. UV/vacuum ultraviolet(VUV)-activated H 2 O 2 advanced oxidation technology is one of the most promising processes to realize the simultaneous removal of SO 2 and NO. From the application perspective, it is necessary to carry out further research in a pilot-scale photochemical reactor with industrial conditions and actual coal-fired flue gas running conditions. RESULTS: Results showed that SO 2 removal efficiency can reach 100% under most experimental conditions. An increase of the VUV irradiation intensity, H 2 O 2 concentration and solution pH can promote NO removal, but the growth rate of that gradually slows down. It is not conducive to NO removal when the flue gas flow and NO concentration increases. Increasing liquid-gas ratio has dual effects on NO removal; NO removal efficiency increases at first, and then decreases sharply. SO 2 concentration has no great impact on removal of NO. Results of ion chromatography (IC) demonstrate that SO 4 2− and NO 3 − are the major removal products of SO 2 and NO. CONCLUSION: The VUV-activated H 2 O 2 advanced oxidation technology is suitable for industrial application. The investment and operating costs of this technology are lower than those of the combined processes NH 3 -SCR and Ca-WFGD.

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“…Moreover, whether it favours reducing by‐product formation such as O 3 and NO x compared with DBD alone was unclear. To our knowledge, direct UV photolysis by excilamps in the gas phase was much lower . Specifically, no study has reported removing VOCs in polluted air using KrCl* and XeCl* excilamps.…”

Section: Introductionmentioning

confidence: 92%

Synergetic Effect Between Plasma and UV for Toluene Conversion in Integrated Combined Plasma Photolysis Reactor with KrCl/KrBr/XeCl/Xe₂ Excilamp

Han

Jiang

et al. 2015

Can J Chem Eng

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An integrated combined plasma photolysis (CPP) reactor, which simultaneously produced dielectric barrier discharge (DBD) plasma and excimer UV radiation, was employed to decompose toluene gas. The study of toluene degradation by the separate processes, realized in three reactors (DBD, UV, and CPP), showed that toluene conversion by CPP was higher than the sum of the conversions for DBD and UV alone, indicating a synergetic effect in CPP between plasma and UV occurred. The degradation performance of gaseous toluene in CPP using different excimer UV sources (XeCl*, KrCl*, KrBr*, Xe2*) was compared, and a regression analysis showed that CPP can enhance toluene conversion by about 50 % and energy yield by 90 %. Radiant spectra and efficiency of excimer UV sources were recorded in detail. Further, it was observed that carbon balance and CO2 selectivity were greatly increased in the CPP in comparison with DBD, accompanied by NO, CO, and O3 being effectively suppressed. Intermediate products in effluent gas using CPP treatment for toluene included formic acid, acetic acid, benzene, benzaldehyde, phenol, benzoic acid, etc. Based on by‐product analysis and excimer UV radiant efficiency, we concluded that toluene degradation is due to electron impact dissociation, excited species and free radical reaction from background gases dissociation, direct photolysis by excimer UV, and synergy between plasma and UV. Among these, electron impact, free radical reaction, and plasma‐UV synergy played critical roles on toluene conversion, while direct UV contribution seems to be minor.

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Photochemical removal of NO2 by using 172-nm Xe2 excimer lamp in N2 or air at atmospheric pressure

Cited by 20 publications

References 30 publications

Novel Process of Simultaneous Removal of Nitric Oxide and Sulfur Dioxide Using a Vacuum Ultraviolet (VUV)-Activated O₂/H₂O/H₂O₂ System in A Wet VUV–Spraying Reactor

Novel Process of Simultaneous Removal of Nitric Oxide and Sulfur Dioxide Using a Vacuum Ultraviolet (VUV)-Activated O₂/H₂O/H₂O₂ System in A Wet VUV–Spraying Reactor

Effects of experimental parameters on simultaneous removal of SO₂ and NO by VUV/H₂O₂ advanced oxidation process in a pilot‐scale photochemical spraying tower

Synergetic Effect Between Plasma and UV for Toluene Conversion in Integrated Combined Plasma Photolysis Reactor with KrCl/KrBr/XeCl/Xe₂ Excilamp

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Photochemical removal of NO2 by using 172-nm Xe2 excimer lamp in N2 or air at atmospheric pressure

Cited by 20 publications

References 30 publications

Novel Process of Simultaneous Removal of Nitric Oxide and Sulfur Dioxide Using a Vacuum Ultraviolet (VUV)-Activated O2/H2O/H2O2 System in A Wet VUV–Spraying Reactor

Novel Process of Simultaneous Removal of Nitric Oxide and Sulfur Dioxide Using a Vacuum Ultraviolet (VUV)-Activated O2/H2O/H2O2 System in A Wet VUV–Spraying Reactor

Effects of experimental parameters on simultaneous removal of SO2 and NO by VUV/H2O2 advanced oxidation process in a pilot‐scale photochemical spraying tower

Synergetic Effect Between Plasma and UV for Toluene Conversion in Integrated Combined Plasma Photolysis Reactor with KrCl/KrBr/XeCl/Xe2 Excilamp

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Product

Resources

About

Novel Process of Simultaneous Removal of Nitric Oxide and Sulfur Dioxide Using a Vacuum Ultraviolet (VUV)-Activated O₂/H₂O/H₂O₂ System in A Wet VUV–Spraying Reactor

Novel Process of Simultaneous Removal of Nitric Oxide and Sulfur Dioxide Using a Vacuum Ultraviolet (VUV)-Activated O₂/H₂O/H₂O₂ System in A Wet VUV–Spraying Reactor

Effects of experimental parameters on simultaneous removal of SO₂ and NO by VUV/H₂O₂ advanced oxidation process in a pilot‐scale photochemical spraying tower

Synergetic Effect Between Plasma and UV for Toluene Conversion in Integrated Combined Plasma Photolysis Reactor with KrCl/KrBr/XeCl/Xe₂ Excilamp