“…Following this, the wafers were placed on a spin coater, covered in a solution of 25 g L À1 dextran (dextran T200, 2 MDa, Pharmacosmos A/S, Denmark) in water, and then spun at 4000 rpm for 40 s, then 5000 rpm for 10 s. The wafers were allowed to dry for 15 minutes, then exposed to UV light (Philips TUV 11 W, peak wavelength 254 nm) at a distance of 10 cm. Dextran gradients were produced by varying the UV exposure time (from 3.5 s to 240 s) along the wafer using a moving shutter, 21 programmed to evenly space the desired exposure durations in discrete steps along the wafer. Following the UV exposure, the wafers were immersed overnight in ultrapure water to remove excess non-attached or physisorbed polymer, then rinsed with water, dried with nitrogen, measured by ellipsometry, and then stored in a dark prior to friction measurements.…”