2018
DOI: 10.1016/j.nanoen.2017.11.009
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Photoconductive noise microscopy revealing quantitative effect of localized electronic traps on the perovskite-based solar cell performance

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Cited by 18 publications
(28 citation statements)
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“…Also, the nanoscopic origins such as point defects and consequent electronic traps are regarded as critical elements on the optoelectronic properties, and, therefore, distinctive deposition routes of perovskite cause a considerable difference in the photovoltaic performance. [3][4][5][6] The postdeposition treatment of the perovskite film is generally utilized to improve the solar cell performance. 7,8 The effects of CH 3 NH 3 Cl (MACl) post-treatment are widely investigated in the aspect of surface properties and perovskite reconstruction, and its values are successfully demonstrated in the state-of-the-art devices.…”
Section: Introductionmentioning
confidence: 99%
“…Also, the nanoscopic origins such as point defects and consequent electronic traps are regarded as critical elements on the optoelectronic properties, and, therefore, distinctive deposition routes of perovskite cause a considerable difference in the photovoltaic performance. [3][4][5][6] The postdeposition treatment of the perovskite film is generally utilized to improve the solar cell performance. 7,8 The effects of CH 3 NH 3 Cl (MACl) post-treatment are widely investigated in the aspect of surface properties and perovskite reconstruction, and its values are successfully demonstrated in the state-of-the-art devices.…”
Section: Introductionmentioning
confidence: 99%
“…In this case, we can assume that each noise source traps and releases charge carriers independently with different relaxation times, and use a previously reported simulation method to obtain the map of the localized charge trap density N eff from the measured normalized PSD map (Figure 4g). [ 14,19,26 ] In the method, a differential analysis based on the Wiener–Khintchine theorem shows that the N eff in the small segment of a 2D film in the area of Δ x Δ y can be written as Neff(f,x,y)=(Δc)2I2fkT×ΔSI(f,x,y)ΔxΔy where the I, f , Δ C , and Δ S I are a current in the film segment, a frequency, a charge carrier number in the film segment, and a current noise PSD generated by the film segment, respectively. For the calculation, we used the Δ x Δ y value of ≈100 nm 2 which is the effective contact area of our conducting AFM probe provided by the manufacturer.…”
Section: Resultsmentioning
confidence: 99%
“…Electrical noises in a conducting channel can be generated by various noise sources. [26,33] In the case of sSWCNTs and metallic thin films on the SiO 2 substrate, localized charge traps in the underlying SiO 2 are reported as a major source of electrical noises. In this case, we can assume that each noise source traps and releases charge carriers independently with different relaxation times, and use a previously reported simulation method to obtain the map of the localized charge trap density N eff from the measured normalized PSD map (Figure 4g).…”
Section: Wwwadvelectronicmatdementioning
confidence: 99%
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