2019
DOI: 10.1021/acsanm.9b00496
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Photocontrol of Supramolecular Azo-Containing Block Copolymer Thin Films during Dip-Coating: Toward Nanoscale Patterned Coatings

Abstract: Dip-coating allows nanostructured block copolymer (BCP) thin film fabrication in a fast and facile one-step process. It can also be coupled with external controls, such as illumination. Herein, we expose several design principles that enable photocontrol of the nanostructured surface pattern and thickness of supramolecular BCP thin films. This is done using a polystyrene-poly(4-vinylpyridine) (PS-P4VP) BCP and two hydroxy-functionalized smallmolecule (SM) azo derivatives that have different photochemical chara… Show more

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Cited by 4 publications
(1 citation statement)
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“…The morphology evolution of dipcoated supramolecular PS-b-P4VP films was investigated over a wide range of withdrawal speeds and the film morphology was found to be governed by film thickness, film composition, and solvent properties. [38][39][40][41] Solvent selectivity was also found to affect the structure of the BCP in solution and thus, the final formation of the dried film morphology. 42 Such studies to control dip-coated BCP films have mainly been limited to PS-b-P4VP by now.…”
Section: Introductionmentioning
confidence: 98%
“…The morphology evolution of dipcoated supramolecular PS-b-P4VP films was investigated over a wide range of withdrawal speeds and the film morphology was found to be governed by film thickness, film composition, and solvent properties. [38][39][40][41] Solvent selectivity was also found to affect the structure of the BCP in solution and thus, the final formation of the dried film morphology. 42 Such studies to control dip-coated BCP films have mainly been limited to PS-b-P4VP by now.…”
Section: Introductionmentioning
confidence: 98%