Photodecomposition ofO-EthylS,S-Diphenyl Phosphorodithiolate (Edifenphos)

Murai, Toshinobu

doi:10.1080/00021369.1977.10862468

Search citation statements

Order By: Relevance

Paper Sections

Select...

Discussion1

Citation Types

Supporting

Mentioning

Contrasting

Year Published

1982

Publication Types

Select...

Article1

Relationship

Self Cite0

Independent1

Authors

Journals

Cited by 1 publication

(1 citation statement)

References 4 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Such a substitution has been found when edifenphos in a hexane solution was UVirradiated. 20) When the photodecomposition rate of prothiof os in a hexane solution was compared under UV-and sunlight exposure conditions, degradation occurred faster under UV light. However, the photoproducts of prothiofos in this solution did not differ significantly.…”

Section: Discussionmentioning

confidence: 99%

Photodecomposition of Prothiofos (O-2, 4-Dichlorophenyl O-Ethyl S-Propyl Phosphorodithioate)

高瀬¹,

小山²,

上山³

1982

J. Pestic. Sci.

View full text Add to dashboard Cite

The photodecomposition of prothiofos (0-2, 4-dichlorophenyl 0-ethyl S-propyl phosphorodithioate) under ultraviolet (UV) light and sunlight was studied. In aqueous and hexane solutions, prothiofos exposed to UV light was rapidly decomposed. Decomposition proceeded mainly from dechlorination at the 2-position of the phenyl group, oxidative desulfuration of the P=S moiety, cleavage of P-0-aryl and P-S-alkyl linkages and the subsequent liberation of phenols.More than 12 photodecomposed products from prothiofos were detected by gas-liquid chromatography (glc); 10 of these were identified. In hexane solution, prothiofos formed a phospholane compound upon UV-irradiation; glc, GC-MS and GCmillimass techniques suggested it to be 5-chloro-2-ethoxy-1, 3, 2-benzoxathiaphosphole 2-sulfide.Practically, no significant differences were observed between the photoproducts formed by UV light and sunlight.

show abstract

Section: Discussionmentioning

confidence: 99%