Abstract:We review our recent progress on the fabrication of near-infrared photodetectors based on intersubband transitions in AlN/GaN superlattice structures. Such devices were first demonstrated in 2003, and have since then seen a quite substantial development both in terms of detector responsivity and high speed operation. Nowadays, the most impressive results include characterization up to 3 GHz using a directly modulated semiconductor laser and up to 13.3 GHz using an ultra-short pulse solid state laser.
“…The AFM analysis showed a root-mean-square surface roughness of about 0.6 nm in an area of 2.5 Â 2.5 "m 2 . From the analysis of the TEM picture, we concluded that the AlN/ GaN interfaces are abrupt at the monolayer scale [36].…”
considerations, we will concentrate on the fabrication and characterization of modulators, switches, photodetectors, and light emitters. At the end of this paper, an outlook to future trends and developments in this emerging field will be given.
“…The AFM analysis showed a root-mean-square surface roughness of about 0.6 nm in an area of 2.5 Â 2.5 "m 2 . From the analysis of the TEM picture, we concluded that the AlN/ GaN interfaces are abrupt at the monolayer scale [36].…”
considerations, we will concentrate on the fabrication and characterization of modulators, switches, photodetectors, and light emitters. At the end of this paper, an outlook to future trends and developments in this emerging field will be given.
“…But uncertainty in material parameters, the lattice mismatch between AlN and GaN, the relaxation peculiarities of wurtzite nitride materials, and the presence of internal pyro-and piezo-electric fields make the simulation of this system only a design guideline but not any kind of valid confirmation of the energy eigen values i.e. absorption spectra [11].…”
Properties of photovoltaics based on intersubband transition have been investigated. Specific structures have been designed to absorb energy efficiently emitted from a black body kept at 1300 K. Fast response has been obtained by reducing the relaxation time of the photo-excited carriers by adjusting the LO phonon scattering rate.
“…AlGaN/GaN multiple quantum well (MQW) structures grown on GaN/sapphire templates (GaN templates) have attracted much interest for intersubband (ISB) transition devices operating in the near-infrared and mid-infrared spectral ranges, such as photovoltaic and photoconductive GaN/AlN quantum well (QW) detectors
[1] and electrooptical modulators
[2], benefiting from the large conduction-band offset (1.75 eV) between GaN and AlN. In addition, material transparency in a wide spectral region (360 nm to 13μm for GaN)
[3], large longitudinal-optical phonon energy (92 meV for GaN), and the rather heavy-electron effective mass (0.22 × m 0 for GaN) also guarantee the realization of ISB transitions at room temperature.…”
High Al content AlxGa1−xN/GaN multiple quantum well (MQW) films with different interlayers were grown by metal organic chemical vapor deposition. These MQWs were designed to achieve intersubband (ISB) absorption in the mid-infrared spectral range. We have considered two growth conditions, with AlGaN interlayer and GaN/AlN superlattice (SL) interlayer, both deposited on GaN-on-sapphire templates. Atomic force microscopy images show a relatively rough surface with atomic-step terraces and surface depression, mainly dominated by dislocations. High-resolution X-ray diffraction and transmission electron microscopy analyses indicate that good crystalline quality of the AlGaN/GaN MQW layer could be achieved when the AlGaN interlayer is inserted. The ISB absorption with a peak at 3.7 μm was demonstrated in MQW films with AlGaN interlayer. However, we have not observed the infrared absorption in MQW films with GaN/AlN SL interlayer. It is believed that the high dislocation density and weaker polarization that resulted from the rough interface are determinant factors of vanished ISB absorption for MQW films with the GaN/AlN SL interlayer.
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