2020
DOI: 10.1039/d0ta02755c
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Photoelectrochemical water splitting: a road from stable metal oxides to protected thin film solar cells

Abstract: The present review offers a detailed analysis of Photoelectrochemical (PEC) devices from metal oxide electrodes forming a semiconductor–liquid junction to protected and catalyst-decorated third generation solar cells adapted into photoelectrodes.

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Cited by 205 publications
(134 citation statements)
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“…Despite significant efforts for improving the properties of typical absorber layers by various post-depositional treatments (PDTs) experienced for TFSCs [ 8 , 24 , 25 , 26 , 27 , 28 ], the procedures and their productivities of stable absorber/electrolyte interface are limited [ 29 ]. To date, most devices utilizing Sb 2 Se 3 layers exhibited parameters significantly below expectations [ 17 , 18 , 19 , 20 , 21 , 22 , 30 , 31 ].…”
Section: Introductionmentioning
confidence: 99%
“…Despite significant efforts for improving the properties of typical absorber layers by various post-depositional treatments (PDTs) experienced for TFSCs [ 8 , 24 , 25 , 26 , 27 , 28 ], the procedures and their productivities of stable absorber/electrolyte interface are limited [ 29 ]. To date, most devices utilizing Sb 2 Se 3 layers exhibited parameters significantly below expectations [ 17 , 18 , 19 , 20 , 21 , 22 , 30 , 31 ].…”
Section: Introductionmentioning
confidence: 99%
“…[ 156 ] Despite extensive studies on protection methods, devices based on III–Vs also possess limited stability in solution. [ 297 ] Progress in these areas is essential for the development of technologies based on these materials.…”
Section: Materials Choice For Pec Water Splittingmentioning
confidence: 99%
“…[ 13,16 ] All those special requirements to improve device stability and efficiency have led to a complex design of photoelectrodes ( Figure ) consisting of multiple layers, of which some are ultrathin. [ 17 ] During the last years, ALD has been applied to fabricate all the essential parts of PEC devices. Here, we review the ALD‐deposition of light absorbers, interlayers, protective layers, and catalysts.…”
Section: Introductionmentioning
confidence: 99%