2019
DOI: 10.1016/j.ijhydene.2019.03.211
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Photoelectrochemical water splitting with 600 keV N2+ ion irradiated BiVO4 and BiVO4/Au photoanodes

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Cited by 11 publications
(6 citation statements)
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“…85,86 Semiconductors are eminently attractive electrode materials for solar-driven PEC water splitting. 34,87,88 To better improve photo-redox reactions, these semiconductors must have a rational bandgap for being activated (i.e., photoexcitation) by light absorption. 89,90 Many types of semiconductors such as TiO 2 , a-Fe 2 O 3 , and BiVO 4 , etc.…”
Section: Application Of the Ion-irradiation Technique For Photoelectr...mentioning
confidence: 99%
See 1 more Smart Citation
“…85,86 Semiconductors are eminently attractive electrode materials for solar-driven PEC water splitting. 34,87,88 To better improve photo-redox reactions, these semiconductors must have a rational bandgap for being activated (i.e., photoexcitation) by light absorption. 89,90 Many types of semiconductors such as TiO 2 , a-Fe 2 O 3 , and BiVO 4 , etc.…”
Section: Application Of the Ion-irradiation Technique For Photoelectr...mentioning
confidence: 99%
“…centers for photogenerated charge carriers, resulting in the decrease of the photocurrent. Srivastav et al 88 investigated the effect of N + ion-irradiation on plasmonic Au nanoparticle loaded BiVO 4 photoelectrodes for PEC water splitting. At an irradiated 2 Â 10 15 ions per cm 2 fluence, the BiVO 4 /Au photoanode shows a photocurrent density of 2.54 mA cm À2 (an increase of approximately 92% in the photocurrent density) higher than the pristine BiVO 4 .…”
Section: Materials Advances Reviewmentioning
confidence: 99%
“…To further investigate the effect of bulk oxygen vacancy on the properties of BiVO 4 , we choose ion irradiation technology to introduce bulk V o inside BiVO 4 . Ion beam technology can efficiently realize material modification. He + ions, as a light element, causes less lattice damage to BiVO 4 nanofilms than other elements. In addition, as an inert element, the He + ion does not react with BiVO 4 when introducing V o .…”
Section: Introductionmentioning
confidence: 99%
“…1−3 However, the photocurrent of BiVO 4 is limited to well below its theoretical maximum value by the slow carrier mobility in the bulk. 4−7 Thus far, extensive efforts and time have been invested to promote the photogenerated charge separation and transfer of BiVO 4 , including facet engineering, 8−10 heterojunction engineering, 11−13 metal deposition, 14,15 modification with electrolytes, 16,17 and doping. 18−20 In particular, heteroelement doping can regulate the electronic structure and atomic arrangement of BiVO 4 .…”
Section: Introductionmentioning
confidence: 99%
“…Thus far, extensive efforts and time have been invested to promote the photogenerated charge separation and transfer of BiVO 4 , including facet engineering, heterojunction engineering, metal deposition, , modification with electrolytes, , and doping. In particular, heteroelement doping can regulate the electronic structure and atomic arrangement of BiVO 4 . A typical example is that a gradient concentration of tungsten was introduced in the BiVO 4 film, which created a distributed homojunction.…”
Section: Introductionmentioning
confidence: 99%