Photoinduced Depolymerization of Poly(olefin sulfone)s Possessing Photobase Generating Groups in the Side Chain

Yaguchi, Hiroaki; Sasaki, Takeo

doi:10.1021/ma702001h

Cited by 32 publications

(34 citation statements)

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“…It has been reported that the depolymerization of poly(olefin sulfone)s is induced efficiently by secondary amines 12. Thus, a compound that generates a secondary amine was chosen as the PBG (Fig.…”

Section: Resultsmentioning

confidence: 99%

“…Photobase generators (PBGs) are neutral compounds that produce basic species when irradiated with light. Thus, when a film of a poly(olefin sulfone) is doped with a PBG, it exhibits depolymerization by photoirradiation 12, 13. In this study, the photoinduced depolymerization of poly(olefin sulfone)s comprised of volatile olefins was investigated.…”

Section: Introductionmentioning

confidence: 99%

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Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator

Sasaki

Kondo

Noro

et al. 2012

J. Polym. Sci. A Polym. Chem.

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Photoinduced depolymerization of poly(olefin sulfone)s mixed with a photobase generating compound was investigated. Irradiation of 254 nm UV light to films comprising of a mixture of a photobase generating compound and poly(olefin sulfone)s with volatile monomers caused photoinduced depolymerization and the irradiated part of the film vaporized. The effect of the poly(olefin sulfone) structure on the photoinduced depolymerization process was investigated. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2012

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator

Sasaki

Kondo

Noro

et al. 2012

J. Polym. Sci. A Polym. Chem.

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“…[7][8][9] The base generation mechanism is shown in Scheme 1. The photobase-generating group was designed to produce a secondary amino group because a secondary amino group can induce effective depolymerization of poly(olefin sulfone)s. 1 The polymers were synthesized according to Scheme 2.…”

Section: Samplesmentioning

confidence: 99%

“…Found: C, 64.66%; H, 7.65%; N, 6.23%. 1 H NMR (CDCl 3, 500 MHz) d 1.44 (m, 6H, ACH 2 A), 1.62-1.68 (m, 6H, ACH 2 A, CyAH), 1.85-1.90 (m, 2H, CyAH), 2.040 (q, 4H, ACH 2 A), 2.33 (t, 2H, ACH 2 A), 3.37 (s, 2H, CyAH), 3.75 (m, 2H, CyAH), 4.88 (m, 1H, CyAH), 4.98 (d, 2H, CH 2 @CHA), 5.05 (d, 2H, CH 2 @CHA), 5.52 (s, 2H, ArACH 2 AOA), 5.80 (m, 1H, CH 2 @CHA), 7.48 (t, 1H, ArAH), 7.55 (d, 1H, ArAH), 7.63 (t, 1H, ArAH), 8.06 (d, 1H, ArAH). 13 C NMR (DMSO, 500MHz) d 24.4 (ACH 2 ACH 2 ACOAOA), 28.2-28.6 (CH 2 @CHACH 2 ACH 2 ACH 2 ACH 2 ACH 2 ACH 2 ACH 2 A, ACH 2 ACH 2 ANA of Cy), 33.1 (CH 2 @CHACH 2 A), 33.7 (ACH 2 ACOAOA), 40.8 (ACH 2 ANA of Cy), 63.2 (AOACH 2 AAr), 68.7 (AOACHA (CH 2 ) 2 A), 114.5 (CH 2 @CHA), 124.6 (ACHA (Ar)), 129.1 (ACHA of Ar), 132.0 (ACA (Ar)), 133.9 (ACHA of Ar), 138.7 (CH 2 @CHA), 147.4 (ACHA (Ar)), 153.8 (NACOAOA), 172.2 (ACH 2 ACOAOA) IR (KBr) 1237 (s, asymm COAO str), 1333 (s, symm NAO str), 1528 (s, asymm NAO str), 1697 (s, C@O str), 2922 (s, CAH str).…”

Section: Journal Of Polymer Sciencementioning

confidence: 99%

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Photoinduced depolymerization of poly(olefin sulfone)s possessing photobase generator side‐chains: Effect of spacer‐chain length

Sasaki

Yoneyama

Hashimoto

et al. 2013

J. Polym. Sci. Part A: Polym. Chem.

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Photoinduced depolymerization of poly(olefin sulfone)s possessing photobase generators in the side‐chain was investigated. Irradiation with UV light generated base on the side‐chains and induced depolymerization based on proton abstraction on the main‐chain. The effect of the length of the spacer chain, which connects the photobase‐generating moiety to the polymer main chain on the photoinduced depolymerization, also was investigated. © 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2013, 51, 3873–3880

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(De)bonding on Demand with Optically Switchable Adhesives

Hohl

Weder

2019

Advanced Optical Materials

100

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nature of polymer-based adhesives prevent their easy removal and stifle or complicate debonding, rebonding, (end-of-life) recycling, and repair. In this context, the development of debonding-on-demand (DoD) adhesive technologies is attracting rapidly growing interest. Indeed, DoD techniques have already entered commercial exploitation in applications such as easily removable wound dressings, [2,3] temporal fixation in semiconductor manufacturing, [4][5][6] and the repair, replacement, or recycling of components. [7][8][9] While many debonding technologies employ heat to reduce the adhesive strength by imparting physical property changes of the adhesive, [10][11][12][13][14] light-induced debonding technologies represent an emerging field and have been much less explored. Photoirradiation is an attractive alternative to thermal debonding as it allows an efficient, contactless, remote stimulation that can be temporally and spatially controlled. [15][16][17][18] Moreover, factors such as the irradiation wavelength, intensity, and time can easily be tuned and it is often possible to focus the energy entry to the adhesive and minimize or avoid exposure of (sensitive) substrates. Of course, the approach requires that at least one of the substrates to be bonded is sufficiently transparent.The design of a light-debondable adhesive system is strongly related to the adhesive type and the requirements imparted by the application(s) for which the adhesive is designed. For instance, pressure-sensitive adhesives (PSAs), such as used in adhesive tapes, need to efficiently adhere under ambient conditions with only a brief application of pressure, they should withstand the (comparably small) loads experienced while bonded, and they must also be easily removable, ideally without leaving any residues on the substrate. [19,20] PSAs are therefore normally based on lightly physically or chemically cross-linked rubbery polymers such as natural rubber, styrene butadiene block copolymers, and acrylics. These materials provide a balance between adhesive and cohesive performance, i.e., adequate stiffness and strength to resist deformation and cohesive failure, and appropriate elasticity in order to establish adequate contact with the substrate. [1] On the other hand, structural adhesives must be able to effectively transmit large loads across the bonded joint and the high strength and high rigidity required for this function are usually achieved by the formation of glassy networks. Examples of such materials include cross-linked epoxy resins, which may possess shear strengths of >35 MPa, cyanoacrylates (superglues), acrylics, and polyurethanes. [19] Adhesives that enable bonding and especially debonding on demand (DoD) have attracted rapidly growing interest in the last decade, as these capabilities greatly improve the functionality of adhesives, particularly in connection with temporal fixation, repair, and recycling. Indeed, DoD techniques have already entered commercial exploitation in applications such as easily removable wound dressin...

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Photoinduced Depolymerization of Poly(olefin sulfone)s Possessing Photobase Generating Groups in the Side Chain

Cited by 32 publications

References 31 publications

Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator

Photoinduced depolymerization in poly(olefin sulfone) films comprised of volatile monomers doped with a photobase generator

Photoinduced depolymerization of poly(olefin sulfone)s possessing photobase generator side‐chains: Effect of spacer‐chain length

(De)bonding on Demand with Optically Switchable Adhesives

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