Photoinduced modification of the catalytic reaction of titanium oxide and palladium in chemical vapor deposition of Al films

Abstract

In chemical vapor deposition of Al thin films, using dimethylaluminum hydride, the catalytic reaction of titanium oxide was enhanced by irradiation of the UV light from a deuterium lamp. In contrast, the light suppressed nucleation on another catalytic Pd surface, which became pronounced at low temperatures. A 160-nm emission band of the deuterium lamp was more effective in the observed photoinduced effects than a 240-nm band.