2021
DOI: 10.1039/d0cc07640f
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Photoisomerization-induced patterning of ion-pairing materials based on anionic azobenzene and its complex with a fluorescent π-electronic system

Abstract: Large mass transport driven by the difference in the photoisomerization-induced surface tension was demonstrated in ion pairs of anionic azobenzene and a cationic polymer. This material motion enabled the fluorescence...

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Cited by 7 publications
(4 citation statements)
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“…Pairing PBs with such photoresponsive polymers results in another photoresponsive material. The Marangoni flow and fluorescence patterning of 27a are triggered by the change in surface tension due to the photoisomerization of 26c − in the presence of N ‐alkylpyridinium‐appended polymer [40] …”
Section: Photoresponsive Ion Pairs Comprising Photoisomerizable Unitsmentioning
confidence: 99%
See 1 more Smart Citation
“…Pairing PBs with such photoresponsive polymers results in another photoresponsive material. The Marangoni flow and fluorescence patterning of 27a are triggered by the change in surface tension due to the photoisomerization of 26c − in the presence of N ‐alkylpyridinium‐appended polymer [40] …”
Section: Photoresponsive Ion Pairs Comprising Photoisomerizable Unitsmentioning
confidence: 99%
“…The Marangoni flow and fluorescence patterning of 27a are triggered by the change in surface tension due to the photoisomerization of 26c − in the presence of N-alkylpyridiniumappended polymer. [40] Adjusting the numbers and lengths of the aliphatic chains attached to azobenzene offers tunable photoresponsivity. Azobenzene with a carboxylate and an aliphatic chain as an ion pair TBA þ -29 − forms a [1 þ 1]-type complex with 27a (Figure 13a).…”
Section: Photoresponsive Ion-pairing Assemblies Including Anion-respo...mentioning
confidence: 99%
“…13 Methods that utilize light to pattern surface features are of particular interest because light provides a simple, clean and non-invasive stimulus for manipulating matter. 14,15 Traditional ultraviolet (UV) photolithographic based indirect subtractive LCP patterning may be possible in conjunction with plasma etching, however incorporating an appropriate mask material that can be both deposited and sacrificially removed without impacting the material quality or alignment is a challenge and this approach does not appear to have been presented in the literature. Direct UV photolithography of an LCP was demonstrated by Yamashita et al, 16 however the yield was limited and optimal crosslinking required elevated temperature.…”
Section: Introductionmentioning
confidence: 99%
“…[13] To date, azobenzene-based materials have received wide attention due to their incomparable functions and widespread applications. [14][15][16][17] Azobenzene-containing -conjugated polymers have high photoisomerization abilities and efficiencies because trans-to-cis isomerization of the azobenzene unit in the conjugated polymer backbone can significantly affect the geometry of the polymer backbone. Consequently, they are commonly distinguished as promising optoelectrical materials.…”
Section: Introductionmentioning
confidence: 99%