Lithography 2013
DOI: 10.1002/9781118557662.ch1
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Photolithography

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Cited by 3 publications
(4 citation statements)
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“…2). This correlation might be explained by the optical proximity effect (OPE), which explains how the shape for a 2-D pattern fabricated using lithographic tools will depend on also the proximity of nearby features 10,[25][26][27] . For large features, the diffraction patterns of exposure do not strongly depend on the separation distance between the geometric shapes.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…2). This correlation might be explained by the optical proximity effect (OPE), which explains how the shape for a 2-D pattern fabricated using lithographic tools will depend on also the proximity of nearby features 10,[25][26][27] . For large features, the diffraction patterns of exposure do not strongly depend on the separation distance between the geometric shapes.…”
Section: Discussionmentioning
confidence: 99%
“…Hence, the lack of systematic quantification and documentation of these factors hamper the effective use of µCP in the biological sciences. The key steps involved in µCP are: (1) fabrication of stamps with the desired geometric size and shape using photolithography [8][9][10] and soft lithography 11,12 , (2) coating of the stamp with cytophilic molecules for immobilisation of cells, and (3) transfer of the cytophilic molecules onto the cytophobic substrate 13,14 . Figure 1 provides a graphical overview of the process in which µCP is used to fabricate a SCA.…”
mentioning
confidence: 99%
“…33−35 Importantly, it utilizes a digital micromirror device (DMD) 32,36 as a dynamic mask, thus replacing the need of a prefabricated static photomask. 37 Furthermore, a dynamic mask, such as this, enables much greater control over shape and mechanical properties of the projected pattern on a submicron resolution and does not require the fabrication of a single-purpose mask or the time constraints of single pixel fabrication. 38,39 Creation of a silk-based solution prior to patterning is traditionally achieved through reconstitution; a process where spun silk is exposed to chaotropic agents to enable resolubilization.…”
Section: ■ Introductionmentioning
confidence: 99%
“…To address such challenges, we present projection microstereolithography (PμSL) as a new route for high resolution silk patterning. PμSL is a 3D printing technique based on photocuring a (bio)­polymer solution. Importantly, it utilizes a digital micromirror device (DMD) , as a dynamic mask, thus replacing the need of a prefabricated static photomask . Furthermore, a dynamic mask, such as this, enables much greater control over shape and mechanical properties of the projected pattern on a submicron resolution and does not require the fabrication of a single-purpose mask or the time constraints of single pixel fabrication. , …”
Section: Introductionmentioning
confidence: 99%