GaAs/SnO 2 :2%Eu heterojunctions are deposited by resistive evaporation and sol-gel-dip-coating techniques respectively, with the top layer thermally annealed at different temperatures. The sample annealed at 200°C/1 h has a much higher conductivity and a lower deepest level (79 meV) than the sample annealed at 400 o C/20 min, for which the deepest level value is 98 meV. The decay of photo-induced current at room temperature for these heterojunctions shows a decay of 48.8% from the initial value for a sample annealed at 200°C/1 h, compared to a decay of 54.2% from the initial value for a sample treated at 400 o C/20 min. The excitation source has a broad band with energy lower than 1.65 eV, assuring that no electron-hole pair is generated in the SnO 2 (top) layer. The data fitting seems to indicate that, although the grain boundary scattering dominates the mobility, the inclusion of time dependent terms is needed, such as multi-center capture or ionized impurity scattering. Photoluminescence data shows that the main Eu 3+ transition changes from 5 D 0 → 7 F 2 (related to ions located at asymmetric sites such as boundary layer) to 5 D 0 → 7 F 1 (related to ions located at symmetric sites), as the annealing temperature is increased.