1988
DOI: 10.1088/0268-1242/3/12/004
|View full text |Cite
|
Sign up to set email alerts
|

Photoluminescence characterisation of InGaAs/GaAs quantum well structures

Abstract: A photoluminescence (PL) study of InGaAs/GaAs strained quantum well (aw) structures is reported. Both fully strained and partially relaxed structures are examined, and we show that carrier localisation in the latter leads to enhanced extrinsic luminescence.Two other sources of localisation are considered, namely alloy and interface fluctuations, and their effect on the PL spectra is discussed. The effect of indium concentration (xln) on the PL spectra is also examined, with greater surface roughening being obs… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
7
0

Year Published

1993
1993
2024
2024

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 24 publications
(7 citation statements)
references
References 25 publications
0
7
0
Order By: Relevance
“…The presence of GaAs-AlOx intermittent structure provides this design with the index contrast necessary to produce a photonic band gap in this system. A steam-based oxidation system has been found to produce AlOx with sufficient mechanical strength, lower stress and optical properties necessary for optical use [4]. …”
Section: Semiconductor Processing Lithographymentioning
confidence: 99%
“…The presence of GaAs-AlOx intermittent structure provides this design with the index contrast necessary to produce a photonic band gap in this system. A steam-based oxidation system has been found to produce AlOx with sufficient mechanical strength, lower stress and optical properties necessary for optical use [4]. …”
Section: Semiconductor Processing Lithographymentioning
confidence: 99%
“…The strong dependence of MQW sample on temperature with its QW PL intensity quenched at different temperatures depending on QW thickness has been reported before. 15 that the higher energy lines from thinner QW quenched at lower temperatures, because of carrier thermal escape to the thicker QW. 10 It can be noted in Figure 3 that the QW of thickness 11.2 nm has a PL survived longer with temperature, which is attributed to exciton dissociation and excess flow of carrier to the QW.…”
Section: Experimenatl Detailsmentioning
confidence: 99%
“…The exciton trapping on the interface misfit dislocations can be excluded based on the slow decrease in luminescence intensity at low temperatures. 31,32 Since such quenching mechanism is not related to the quality of material but is an intrinsic property of the QWs, one must increase the confinement energy of the QWs by employing large manganese CdMnTe barrier layers to improve the de-vice operation, which is also the reason that we study CdTe/ CdMnTe SQWs with large manganese in this article.…”
Section: Luminescence Quenching Mechanismmentioning
confidence: 99%