“…Compared to top-down lithography approaches, NSL is a low-cost, simple fabrication technique that can achieve sub-100 nm feature sizes without the need for complex protocols or expensive equipment . NSL has been demonstrated as a useful nanoscale patterning approach in many applications, including surface-enhanced Raman scattering, , patterning of nanogap electrodes, gas sensing, antireflection coatings for solar cells, , photoluminescence, , optical fiber tip nanoprobes, plasmonic electrodes, , and superhydrophobic surfaces . Since the first demonstration of equilateral triangle and dot array patterns by Hulteen and Van Duyne, NSL has been used to achieve a wide range of pattern geometries, such as bimetallic “cup-like structures”, rods, and rings produced by shadow (or “angle-resolved”) NSL, − core–shell-structured nanohole arrays in conjunction with triangular nanopillars, and nanobridged NSL featuring connective linkages between nanospheres .…”