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Subject of study. Epitaxial films of Hg0.7Cd0.3Te solid solutions grown by molecular beam epitaxy and doped with arsenic to obtain hole-type conductivity in order to form p-n junctions for the production of infrared photodetector structures are studied. Aim of study. The types and characteristics of defects formed during arsenic doping of epitaxial films of Hg0.7Cd0.3Te solid solutions grown by molecular beam epitaxy and the effect of doping on the level of disorder in the solid solution are determined. Method. Ellipsometry, optical transmittance, photoluminescence, and photoreflectance are used. Main results. The initial material is shown to have high quality in terms of film bulk and surface quality, and the quality was found to improve after two-stage activation thermal annealing. Annealing has been shown to activate the arsenic with the formation of shallow (7–8 meV) acceptor levels. No side defects were found to occur as a result of the introduction of arsenic into the films during growth and annealing. Practical significance. This research demonstrated the effectiveness of doping epitaxial films of Hg0.7Cd0.3Te solid solutions with arsenic as an acceptor impurity in order to produce layers with hole conductivity during the production of photodiode structures.
Subject of study. Epitaxial films of Hg0.7Cd0.3Te solid solutions grown by molecular beam epitaxy and doped with arsenic to obtain hole-type conductivity in order to form p-n junctions for the production of infrared photodetector structures are studied. Aim of study. The types and characteristics of defects formed during arsenic doping of epitaxial films of Hg0.7Cd0.3Te solid solutions grown by molecular beam epitaxy and the effect of doping on the level of disorder in the solid solution are determined. Method. Ellipsometry, optical transmittance, photoluminescence, and photoreflectance are used. Main results. The initial material is shown to have high quality in terms of film bulk and surface quality, and the quality was found to improve after two-stage activation thermal annealing. Annealing has been shown to activate the arsenic with the formation of shallow (7–8 meV) acceptor levels. No side defects were found to occur as a result of the introduction of arsenic into the films during growth and annealing. Practical significance. This research demonstrated the effectiveness of doping epitaxial films of Hg0.7Cd0.3Te solid solutions with arsenic as an acceptor impurity in order to produce layers with hole conductivity during the production of photodiode structures.
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