2008
DOI: 10.1016/j.spmi.2008.01.011
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Photoluminescence of Ge nanocrystals self-assembled on SiO2

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Cited by 18 publications
(32 citation statements)
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“…For this reason it was thought that the TB model simulates more accurately the effect of NC size on bandgap in Ge NCs. From our earlier experimental work, 18 there was a more reasonable agreement between our results and the TB model calculation.…”
Section: Methodssupporting
confidence: 87%
See 1 more Smart Citation
“…For this reason it was thought that the TB model simulates more accurately the effect of NC size on bandgap in Ge NCs. From our earlier experimental work, 18 there was a more reasonable agreement between our results and the TB model calculation.…”
Section: Methodssupporting
confidence: 87%
“…1 were measured using a Bomem DA3 Fourier transform infrared spectrometer with samples at 5 K excited with 100 mW at 457.9 nm from an argon ion laser, which was above the bandgap energy for NCs larger than 3.3 ͓1.7͔ nm assuming a k · p ͓tight binding ͑TB͔͒ model bandgap. 18 Reference 12 argues that the k · p approximation overestimates the carrier confinement in Si NCs and that a similar overestimation occurs for Ge NCs. For this reason it was thought that the TB model simulates more accurately the effect of NC size on bandgap in Ge NCs.…”
Section: Methodsmentioning
confidence: 99%
“…For the present samples [25], silicon (001) substrates supplied by STMicroelectronics covered by a homogeneous 5 nm thick layer of thermally grown amorphous SiO 2 were used. Ge atoms were deposited by electron beam evaporation at a rate of 0.05 nm/sec at a pressure of 1x10 −10 Torr on SiO 2 surfaces pre-cleaned chemically in sulfuric peroxide mixture (H 2 SO 4 :H 2 O 2 (3:1)) and in acidic peroxide mixture (HCl : H 2 O 2 : H 2 O (1 : 1 : 20)) solutions followed by rapid thermal annealing at 700 °C in ultrahigh vacuum.…”
Section: Methodsmentioning
confidence: 99%
“…For these experiments, the Ge NCs were then capped with a 15-nm thick layer of a-Si in situ, i.e., the Ge NCs were never exposed to air. In table I we provide the Ge layer thickness, h 0 , and mean NC diameter obtained for each of the structures grown by this process described in detail previously [25]. Using high resolution transmission electron microscopy (HRTEM) images, average NC diameters were obtained from the analysis of plan view micrographs [25].…”
Section: Methodsmentioning
confidence: 99%
“…The common structural characteristic is that the Ge QDs are randomly distributed in the SiO 2 matrix with non-uniform size. 13,16 To realize practical applications, the Ge QDs need to be accurately controlled with the position, size, and density. However, the difficulty in the realization of these goals has prevented the exploration with further progress despite intensive studies of Ge QDs embedded in the SiO 2 matrix.…”
Section: Thermally Oxidized Formation Of New Ge Dots Over As-grown Gementioning
confidence: 99%