2012
DOI: 10.1063/1.3692747
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Photoluminescence of Nd-doped SnO2 thin films

Abstract: Structural, optical, and electrical properties of Nd-doped SnOx thin films are reported. The atomic structure was characterized by x-ray diffraction and infrared absorption spectrometry. Investigation of the photoluminescence properties revealed Nd-related bands at 920 and 1100 nm for samples annealed at 700 °C, which present the tetragonal structure of the SnO2 rutile phase. Nd3+ ions can be indirectly excited and no concentration quenching was observed up to 3 at. %. It is concluded that Nd3+ ions are effici… Show more

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Cited by 53 publications
(25 citation statements)
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“…A synthesis of the Hall effect results is presented in Table 2 where the best values of electrical resistivity and carriers mobility are about 4.0 10 −2 Ω cm and 0.90 cm 2 /V s respectively obtained for 1% effective (3% nominal) Nd doping. Such results are in agreement with those recently reported in Nd-doped SnO 2 thin films [40].…”
Section: -P3supporting
confidence: 83%
“…A synthesis of the Hall effect results is presented in Table 2 where the best values of electrical resistivity and carriers mobility are about 4.0 10 −2 Ω cm and 0.90 cm 2 /V s respectively obtained for 1% effective (3% nominal) Nd doping. Such results are in agreement with those recently reported in Nd-doped SnO 2 thin films [40].…”
Section: -P3supporting
confidence: 83%
“…Therefore, it is very important to synthesize nanoparticles with desired sizes and properties. The common routes used for the synthesis of nanoparticles include sol-gel method [3,4], hydrothermal technique [5], polyol method [6], chemical vapor deposition [7], spray pyrolysis [8,9], pulsed laser deposition [10], high vacuum evaporation [11], and co-precipitation [12,13].…”
Section: Introductionmentioning
confidence: 99%
“…Table I summarizes the reported optical properties and sheet resistance values of various doped and undoped SnO2 films. [23][24][25][26][27][28][29][30][31][32][33][34][35][36] Our R sh found to be higher than that of the previous contributions on FTO films. 14,23,24,26 But, the decreasing trend of sheet resistance with increasing film's thickness is consistent with that of earlier measurements.…”
Section: Discussionmentioning
confidence: 70%