1986
DOI: 10.1002/pola.1986.080240811
|View full text |Cite
|
Sign up to set email alerts
|

Photolysis of aromatic diisocyanate‐based polyurethanes in solution

Abstract: Fluorescence analysis has been employed as an analytical technique to elucidate the photolysis mechanism of several aromatic diisocyanate‐based polyurethanes in solution. Based on a comparison with model arylmonocarbamates and arylbiscarbamates, the photo‐Fries rearrangement and cleavage‐type products found for the small‐model arylcarbamates were also identified for the photolyzed polyurethanes in solution. Viscosity and absorbance change results for photolysis of both air and nitrogen‐saturated polyurethane s… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

3
19
0

Year Published

1987
1987
2018
2018

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 29 publications
(22 citation statements)
references
References 14 publications
3
19
0
Order By: Relevance
“…The oxidation of the urethane groups can lead to a strong chromophore structure responsible for the yellowing of PU. From the photo-oxidation mechanism, a possible mechanism of TDI-based PUs thermal degradation was proposed in Scheme 2C (Hoyle and Kim, 1986). The degradation proceeds as a two-step process, giving first the primary aromatic amine products followed by a subsequent reaction to give a quinoid-type compound.…”
Section: Resultsmentioning
confidence: 99%
“…The oxidation of the urethane groups can lead to a strong chromophore structure responsible for the yellowing of PU. From the photo-oxidation mechanism, a possible mechanism of TDI-based PUs thermal degradation was proposed in Scheme 2C (Hoyle and Kim, 1986). The degradation proceeds as a two-step process, giving first the primary aromatic amine products followed by a subsequent reaction to give a quinoid-type compound.…”
Section: Resultsmentioning
confidence: 99%
“…The broadness of the emission peak at 400 -500 nm may be due not only to photo-Fries, but also to quinone-imide type compounds (Scheme 2) and other unknowns. 12 These phenomena might be attributed to the electron-donating nature of isopropylidene, which contributes stability to the transition state of photodegradation and leads to many types of photolytic mechanisms. Our present study, however, deals only with the photo-Fries type mechanism.…”
Section: Photolysis Of Model Compounds In Dmfmentioning
confidence: 99%
“…This is due to inhibition of cleavage by oxygen. 12 From this discussion, the photostability of the bisphenol-based polyurethanes in the oxygen atmosphere appears to be as shown in equation (10): For all polymers, we investigated changes in UV absorbance (400 nm) during photolysis and in the presence of nitrogen and oxygen. Figure 10 shows these changes for 0.5 wt % bisphenol Sbased polyurethane in DMF.…”
Section: Influence Of Oxygen and Nitrogen On Viscositymentioning
confidence: 99%
See 1 more Smart Citation
“…The photochemical evolution of the hard segments based on 4,4'methylene bis(phenyl isocyanate) (MDI) involves a dual mechanism. One is the photo-Fries type reaction [3] and the other is an induced oxidation of the central methylene group of MDI [4,5,6]. The latter reaction does not occur in toluene diisocyanate based hard segments due to the absence of methylene groups.…”
Section: Introductionmentioning
confidence: 99%