1989
DOI: 10.1039/f19898502369
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Photolysis of cyclotetrasilanes. Remarkable dependence on molecular structure

Abstract: Photolysis of cyclotetrasilanes has been carried out by laser flash photolysis in methylcyclohexane (MCH) at 293 K and steady-state photolysis in methylcyclohexane-isopentane (MP; 3: 1, v/v) glass at 77 K. The photolysis patterns are remarkably dependent on the molecular structures of cyclotetrasilanes. The planar persilylcyclotetrasilanes 1 and 2 give rise to the corresponding disilenes (D1 and D2) with absorption peaks at 410 nm at 293 K and at 415 nm at 77 K. For the peralkylcyclotetrasilanes 3 and 4 having… Show more

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Cited by 17 publications
(2 citation statements)
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“…2 and table 1. This trend can be understood by considering the fact that the reactivity for the photolysis of the former (planar form) is greater than that of the latter (bent form) even at 77 K. 31 That is, the Si-Si bond length(s) for the former may become long in the S: state compared to that of the latter.…”
Section: Av = a E * + A Ementioning
confidence: 99%
“…2 and table 1. This trend can be understood by considering the fact that the reactivity for the photolysis of the former (planar form) is greater than that of the latter (bent form) even at 77 K. 31 That is, the Si-Si bond length(s) for the former may become long in the S: state compared to that of the latter.…”
Section: Av = a E * + A Ementioning
confidence: 99%
“…The photochemistry of cyclic oligosilanes has been studied extensively because these compounds are important sources for reactive intermediates such as silyl radicals, silylenes, and disilenes [1][2][3][4][5][6][7]. However, there are few reports on the photochemistry of the corresponding cyclic oligogermanes.…”
Section: Introductionmentioning
confidence: 99%