Photomechanical behaviors of the films of 4-[bis(9,9-dimethylfluoren-2-yl)amino]-4'cyanoazobenzene (CN-BFlAB) and 4-[bis(9,9-dimethylfluoren-2-yl)amino]-4'-nitroazobenzene (NO 2-BFlAB) fabricated on the surface of agar gel have been investigated. Two-stage process including striped pattern formation and the subsequent band-like structure formation was observed upon irradiation with a linearly polarized laser beam with 488 nm, being similar to the result for the film of the parent compound, 4-[bis(9,9-dimethylfluoren-2-yl)amino]azobenzene (BFlAB). The rate of such structural change for CN-BFlAB was almost similar to or somewhat slower than that for BFlAB film. On the other hand, the rate for NO2-BFlAB was considerably slower than those for BFlAB and CN-BFlAB. The results suggested that the photochromic reactivity of the molecule in the amorphous film plays a role for the present photomechanical behaviors.