2023
DOI: 10.1063/5.0147584
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Photon-counting with single stoichiometric TiN layer-based optical MKIDs

Abstract: We demonstrate the single photon counting mode at 405 and 850 nm with stoichiometric TiN-based microwave kinetic inductance detectors realized on a sapphire substrate and operated at bath temperatures over 300 mK. The detectors use single 15–25 nm-thick TiN layers featuring a critical temperature in the 2–3 K range. We found that the energy-resolving power R=E/ΔE exhibits an optimum with bath temperature, occurring in the 300–450 mK range, which can be almost double compared to those obtained at the lowest tem… Show more

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Cited by 5 publications
(11 citation statements)
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“…We have also obtained an analytical solution of RT equations for superconductors with relatively slow relaxation at low temperatures with various phonon-trapping factors. We further considered QP diffusion in the superconductor and fitted the diffusion coefficient (D qp ) and the pair-breaking coefficient (η), showing there is a significant increase in η as the bath temperature increases, which can be the reason for the increasing responsivity of TiN under illumination observed elsewhere [13]. The fitted D qp is significantly smaller than expected, which can be why the QPs relax quickly after the photon absorption.…”
Section: Introductionmentioning
confidence: 87%
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“…We have also obtained an analytical solution of RT equations for superconductors with relatively slow relaxation at low temperatures with various phonon-trapping factors. We further considered QP diffusion in the superconductor and fitted the diffusion coefficient (D qp ) and the pair-breaking coefficient (η), showing there is a significant increase in η as the bath temperature increases, which can be the reason for the increasing responsivity of TiN under illumination observed elsewhere [13]. The fitted D qp is significantly smaller than expected, which can be why the QPs relax quickly after the photon absorption.…”
Section: Introductionmentioning
confidence: 87%
“…The TiN films are deposited on sapphire substrates by magnetron sputtering, which are then patterned into resonators using photolithography and reactive ion etching. The films' internal quality factor Q i is relatively low as they are fabricated on sapphire [13,14,39], which is probably due to the lattice mismatch on their interface. The MKIDs design of TiN 1K can be found in the appendix B The design of TiN 2K and TiN 4K can be found in our previous publication [13].…”
Section: Mkids Characterizationmentioning
confidence: 99%
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