Photonic Crystal Cavity Lasers Patterned by a Combination of Holography and Photolithography

Cho, Chi-O; Lee, Joonhee; Park, Yeonsang; Roh, Yeong-Geun; Jeon, Heonsu; Kim, In

doi:10.1109/lpt.2007.893903

Cited by 6 publications

(5 citation statements)

References 12 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…We have previously shown that conventional photolithography can be used to fabricate PC waveguides and cavities on a holographically generated PC background. 10,11 In this case, however, the sizes of the defects formed are considerably larger than the lattice constant of the PC. Further, the inevitable alignment error makes it difficult to generate defects of the desired type at the desired locations.…”

Section: Single-defect Photonic Crystal Cavity Laser Fabricated By a mentioning

confidence: 89%

Single-defect photonic crystal cavity laser fabricated by a combination of laser holography and focused ion beam lithography

Ahn

Kim

Jeon

2010

Applied Physics Letters

Self Cite

View full text Add to dashboard Cite

show abstract

Section: Single-defect Photonic Crystal Cavity Laser Fabricated By a mentioning

confidence: 89%

Single-defect photonic crystal cavity laser fabricated by a combination of laser holography and focused ion beam lithography

Ahn

Kim

Jeon

2010

Applied Physics Letters

Self Cite

View full text Add to dashboard Cite

show abstract

“…Photonic crystal (PhC) cavities have attracted much attention in the last decade due to their high Q factor and small mode volume [9], [10]. They are applied in different devices, including lasers [11], light emitting diodes [12], [13], and single-photon sources [14] and so on. Ultra-low power optical bistability has also been obtained in the PhC cavities due to the strong light-matter interactions in the PhC cavities [15].…”

Section: Introductionmentioning

confidence: 99%

Low Power and Large Modulation Depth Optical Bistability in an Si Photonic Crystal L3 Cavity

Zhang

Zeng

et al. 2014

IEEE Photon. Technol. Lett.

View full text Add to dashboard Cite

Optical bistability with low power and large modulation depth is observed in the silicon 2D photonic crystal 3 defect-long (L3) cavity coupling with a photonic crystal waveguide experimentally. The cavity-waveguide resonator system operates under the critical coupling condition. The triangular line shape of the cavity resonance and the hysteresis loop of the system is observed. The switching contrast is 7.7 dB and the modulation depth is 0.70 at the switching power of −12.1 dBm. A nonlinear coupled mode model is established to analyze the behavior of the cavity, and numerical simulation results are in good agreement with the experiment results.

show abstract

“…9,10 The obtained 2D nano-patterns can have a wide variety of applications, such as photonic devices, [11][12][13][14] information storage devices, 15,16 solar cells, 17 and bio-and chemical-sensors. To fabricate micro-patterned 2D nano-patterns, the combination processes of conventional photolithography and the nano-patterning process have been examined, such as combined processes of photolithography and laser hologram lithography, 21 and combined processes of photolithography and nanoimprint lithography. To fabricate micro-patterned 2D nano-patterns, the combination processes of conventional photolithography and the nano-patterning process have been examined, such as combined processes of photolithography and laser hologram lithography, 21 and combined processes of photolithography and nanoimprint lithography.…”

mentioning

confidence: 99%

“…[18][19][20] In order to apply the NSL technology to various electrically-driven devices, a micro-patterning process of 2D nano-patterns is required. To fabricate micro-patterned 2D nano-patterns, the combination processes of conventional photolithography and the nano-patterning process have been examined, such as combined processes of photolithography and laser hologram lithography, 21 and combined processes of photolithography and nanoimprint lithography. 22 However, a fabrication process for micro-patterns to be incorporated into NSL processes has not yet been reported.…”

mentioning

confidence: 99%

Fabrication of Micro-Patterned 2D Nanorod and Nanohole Arrays by a Combination of Photolithography and Nanosphere Lithography

Park¹,

Moon²,

Yoon³

et al. 2011

J. Electrochem. Soc.

View full text Add to dashboard Cite

This paper reports a facile fabrication technique for micro-patterned two-dimensional (2D) nanorod and nanohole arrays. This technique is based on a combination of two simple and scalable processes: photolithography for micro-patterns and nanosphere lithography (NSL) for nano-patterns. Mixed patterns, such as micro-scale line patterned 2D SiO 2 nanoarrays, can be routinely fabricated over a quartz substrate owing to the high reproducibility of this simple method. In micro-patterned 2D nanoarrays, the structural dimensions of micro-patterns can be controlled by general optimization of photolithography techniques; structural dimensions of nano-patterns can be controlled with the NSL technique. We demonstrate micro-patterned fluorescence images of SrGa 2 S 4 :Eu 2þ thin-film phosphors (TFPs) by depositing TFPs on micro-patterned 2D SiO 2 photonic crystal (PC) nanoarrays using rf-magnetron sputtering technique. It is expected that photolithography-assisted NSL will be incorporated easily in the fabrication of micro-patterned PC for the various photonic or optoelectronic devices.

show abstract

Photonic Crystal Cavity Lasers Patterned by a Combination of Holography and Photolithography

Cited by 6 publications

References 12 publications

Single-defect photonic crystal cavity laser fabricated by a combination of laser holography and focused ion beam lithography

Single-defect photonic crystal cavity laser fabricated by a combination of laser holography and focused ion beam lithography

Low Power and Large Modulation Depth Optical Bistability in an Si Photonic Crystal L3 Cavity

Fabrication of Micro-Patterned 2D Nanorod and Nanohole Arrays by a Combination of Photolithography and Nanosphere Lithography

Contact Info

Product

Resources

About