2018
DOI: 10.1063/1.5034314
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Photonic trimming of quantum emitters via direct fabrication of metallic nanofeatures

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Cited by 3 publications
(3 citation statements)
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“…For the three Pt-based nanopillars (left low corner in Figure 2), it is worth mentioning no significant change in the lifetime was detected, meaning that a plasmonic coupling between the quantum emitter and the deposited structure can be ruled out: this is likely due to the latter's relatively small Pt content (around 30% with the used deposition parameters), resonance frequency, and the distance of the buried QD from the surface that prevents efficient overlapping of the QD's dipole with the mode sustained by the antenna. As plasmonic effects have already been achieved using the same deposition technique, 28 we believe that this unsatisfactory performance can be mostly ascribed to the planarization technique hereby employed, which provides limited control over the dot's final distance from the surface.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
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“…For the three Pt-based nanopillars (left low corner in Figure 2), it is worth mentioning no significant change in the lifetime was detected, meaning that a plasmonic coupling between the quantum emitter and the deposited structure can be ruled out: this is likely due to the latter's relatively small Pt content (around 30% with the used deposition parameters), resonance frequency, and the distance of the buried QD from the surface that prevents efficient overlapping of the QD's dipole with the mode sustained by the antenna. As plasmonic effects have already been achieved using the same deposition technique, 28 we believe that this unsatisfactory performance can be mostly ascribed to the planarization technique hereby employed, which provides limited control over the dot's final distance from the surface.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…By means of 3D scanning of the electron beam, EBID allows for the local deposition of a target material and the fabrication of complex nanofeatures while retaining the typical resolution of EBL, , with the additional benefit of a remarkable flexibility in terms of material choice: both oxides, such as SiO 2 , and metals, such as Pt and Au, can be deposited in a single processing run by interchanging gases. This paves the way for a direct deposition of hard masks to be used in subsequent dry etching steps or of plasmonic and dielectric nanostructures aimed at improving light extraction efficiency and/or tailoring of the emitters’ properties …”
Section: Introductionmentioning
confidence: 99%
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