1983
DOI: 10.1021/ic00158a010
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Photooxidation of trichlorosilane in silicon tetrachloride

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1983
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Cited by 10 publications
(2 citation statements)
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“…[79,80] The conjugate acid trichlorosilanol, HOSiCl 3 , has been mentioned more often in literature. Trichlorosilanol was prepared by partial hydrolysis of SiCl 4 , [81,82] by photooxidation of trichlorosilane in SiCl 4 , [83] by gas phase reactions and in an argon matrix. [84,85] The gas phase acidity of trichlorosilanole was reported to be comparable to that of HBr and HNO 3 .…”
Section: Group 16mentioning
confidence: 99%
“…[79,80] The conjugate acid trichlorosilanol, HOSiCl 3 , has been mentioned more often in literature. Trichlorosilanol was prepared by partial hydrolysis of SiCl 4 , [81,82] by photooxidation of trichlorosilane in SiCl 4 , [83] by gas phase reactions and in an argon matrix. [84,85] The gas phase acidity of trichlorosilanole was reported to be comparable to that of HBr and HNO 3 .…”
Section: Group 16mentioning
confidence: 99%
“…As such there is a need to develop a greater understanding of the reactions of SiCl 4 and the role of silicon oxychloridesas may be illustrated by the photochemical synthesis and determination by infrared spectroscopy of trichlorosilanol SiCl 3 OH in SiCl 4 . 8,9 Matrix isolation is an established method to study reaction intermediates and mechanism. 10 Many silicon compounds have been investigated using this approach but there is only limited information on the hydrolysis or alcoholysis reactions of silicon tetrahalides.…”
Section: Introductionmentioning
confidence: 99%