Photopolymerizable Silicone Monomers, Oligomers, and Resins

Jacobine, A. F.; Nakos, S. T.

doi:10.1007/978-1-4899-0712-7_5

Cited by 26 publications

(32 citation statements)

References 51 publications

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“…[3,7,9,10] An important advantage of thiol-ene photopolymerization is that it can proceed in the presence of oxygen. [11] Conventional free radical polymerization in the presence of oxygen leads to the formation of peroxide, which slows the chain reaction mechanism of curing down. Conversely, thiol-ene photopolymerization incorporates oxygen into the growing chain of polymer.…”

Section: Full Papermentioning

confidence: 99%

Influence of the Thiol Structure on the Kinetics of Thiol‐ene Photopolymerization with Time‐Resolved Infrared Spectroscopy

Wutticharoenwong

Soucek

2008

Macro Materials & Eng

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Photopolymerization kinetics of difunctional thiols with alkenes were studied. Two of the thiols, trans‐1,4‐bis(mercaptomethyl)cyclohexane (CHDMT) and 1,4‐bis(mercaptomethyl)benzene (BDMT) were synthesized. The CHDMT was synthesized via a two step process using potassium thioacetate and hydrochloric acid as reagents. The BDMT was synthesized by a one step process using 1,4‐benzenedimethanebromine with thiourea and potassium hydroxide as reagents. Three types of alkenes (divinyl ether, diallyl ether, and dimethacrylate) were reacted with CHDMT, BDMT or 1,8‐octanedithiol (ODT). The photopolymerization was investigated with and without a photoinitiator. The kinetics of the thiol‐ene photopolymerization was investigated by time‐resolved infrared spectroscopy. It was proposed that the steric hindrance of the cyclohexane (CHDMT) resulted in a lower rate of photopolymerization compared to BDMT and ODT. The vinyl ether (alkene) exhibited the highest activity compared to allyl ether and acrylate which was attributed to a high electron density of the alkene. Incorporation of photoinitiator increased the reaction rate and final conversion of the system, particularly in the ODT system.

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Section: Full Papermentioning

confidence: 99%

Influence of the Thiol Structure on the Kinetics of Thiol‐ene Photopolymerization with Time‐Resolved Infrared Spectroscopy

Wutticharoenwong

Soucek

2008

Macro Materials & Eng

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“…[1][2][3][4][5][6][7][8] Addition of thiol functionality to (meth)acrylate systems provides the advantage of higher conversions upon UV cure, without need of added photoinitiators or heat, and the system is uninhibited by oxygen. 9,10 Moreover, with the addition of mercapto functional components, materials gain increased homogeneity in mechanical properties and lower shrinkage in the solid state. [11][12][13] Further, due to the step-growth polymerization mechanism of the thiol-meth(acrylate) reaction, high molecular weights or highly crosslinked networks are not obtained until high conversions, a significant contrast when compared with conventional free radically curing systems.…”

Section: Introductionmentioning

confidence: 99%

Methacrylated dendrimers in thiol‐methacrylate networks and the effect of conversion on the thermoset properties

Nilsson

Malmström

Johansson

et al. 2009

J. Polym. Sci. A Polym. Chem.

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A series of well‐defined methacrylate‐functionalized polyester dendrimers based on 2,2‐bis(methylol)propionic acid (bis‐MPA) has been synthesized divergently. The thermal properties and conversion of the methacrylate functional dendrimers are investigated along with the structure‐property relationship of networks composed of the methacrylate dendrimers and two commercially available trifunctional thiols, trimethylolpropane tri(3‐mercaptopropanoate) (TRIS) and ethoxylated trimethylolpropane tri(3‐mercaptopropanoate) (ETTMP). The thiol‐methacrylate reactions were conducted at room temperature, under ambient conditions, and triggered by UV light in the presence of a photoinitiator. Crosslinked films were obtained and characterized with respect to conversion (FT‐Raman) and thermal (DSC and TGA) properties. © 2009 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 5815–5826, 2009

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“…132,133 Both types of chemistry have been discussed in a comprehensive review article on photopolymerizable silicone monomers, oligomers, and resins. 41 The introduction of a dimethyl-siloxane group between two cycloaliphatic epoxy groups was found to increase drastically the reactivity of these monomers. 59,134 The cyclo epoxy group can be located at the ends of the polydimethylsiloxane chain and/or on pendent groups.…”

Section: Release Coatingsmentioning

confidence: 99%

“…With the development of new types of prepolymers, such as vinyl functionalized silicones, 41 there has been an increased interest in the thiol/ene photopolymerization, in particular for PSAs and sealants applications. 2 The lack of O 2 inhibition is an important advantage here, because siloxane fluids are known to be highly permeable to oxygen.…”

Section: Thiol-polyene Systemmentioning

confidence: 99%

UV-Radiation Curing of Adhesives

Decker¹

2011

Handbook of Adhesives and Surface Preparation

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Photopolymerizable Silicone Monomers, Oligomers, and Resins

Cited by 26 publications

References 51 publications

Influence of the Thiol Structure on the Kinetics of Thiol‐ene Photopolymerization with Time‐Resolved Infrared Spectroscopy

Influence of the Thiol Structure on the Kinetics of Thiol‐ene Photopolymerization with Time‐Resolved Infrared Spectroscopy

Methacrylated dendrimers in thiol‐methacrylate networks and the effect of conversion on the thermoset properties

UV-Radiation Curing of Adhesives

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