1990
DOI: 10.1103/physrevb.41.2936
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Photoreflectance study on residual strain in heteroepitaxial gallium arsenide on silicon

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Cited by 32 publications
(4 citation statements)
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“…5 showing a very good agreement with the experiment. The curves for InP/Si and GaAs/Si were calculated without fitting using the depth dependence of the mechanical strain measured by PL and obtained from literature, 28 respectively.…”
Section: Resultsmentioning
confidence: 99%
“…5 showing a very good agreement with the experiment. The curves for InP/Si and GaAs/Si were calculated without fitting using the depth dependence of the mechanical strain measured by PL and obtained from literature, 28 respectively.…”
Section: Resultsmentioning
confidence: 99%
“…Previous photoelectric performance tests have shown that the efficiency of charge separation and transfer is MoO 2 /BiOBr-0 > MoO 2 /BiOBr-1 > MoO 2 /BiOBr-2 > MoO 2 > BiOBr. In order to explore its underlying reasons, the changes in the BIEF intensity of these materials were measured using a model developed by Kanata et al , 51 as shown in Fig. 7c.…”
Section: Resultsmentioning
confidence: 99%
“…Данная зависимость наблюдалась в экспериментах по ФО GaAs при малых уровнях P las [23,24], однако никакого физического обоснования этому в данных работах приведено не было. Позже были выведены математические выражения, согласно которым обсуждаемая зависимость имеет логарифмический характер [25,26]. В этих работах указывается, что амплитуда сигнала ФО пропорциональна изменению диэлектрической функции полупроводникового материала на поверхности, которое зависит от разности между поверхностным потенциалом при наличии воздействия модулирующего излучения и без него.…”
Section: измерение фо в ближнем ик-диапазоне 21 классическая измерительная техника фоunclassified