Photoresists and Advanced Patterning

Henderson, Cliff

doi:10.1016/b978-0-444-53349-4.00201-6

Cited by 4 publications

(2 citation statements)

References 141 publications

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“…Here, we give a short description of the most popular commercial PRs employed in the formulation of NCPRs classified according to their composition. Additional details on the photochemistry of PRs can be found elsewhere (Henderson, 2012).…”

Section: The Host Matrixmentioning

confidence: 99%

Recent Advances on Nanocomposite Resists With Design Functionality for Lithographic Microfabrication

et al. 2021

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Nanocomposites formed by a phase-dispersed nanomaterial and a polymeric host matrix are highly attractive for nano- and micro-fabrication. The combination of nanoscale and bulk materials aims at achieving an effective interplay between extensive and intensive physical properties. Nanofillers display size-dependent effects, paving the way for the design of tunable functional composites. The matrix, on the other hand, can facilitate or even enhance the applicability of nanomaterials by allowing their easy processing for device manufacturing. In this article, we review the field of polymer-based nanocomposites acting as resist materials, i.e. being patternable through radiation-based lithographic methods. A comprehensive explanation of the synthesis of nanofillers, their functionalization and the physicochemical concepts behind the formulation of nanocomposites resists will be given. We will consider nanocomposites containing different types of fillers, such as metallic, magnetic, ceramic, luminescent and carbon-based nanomaterials. We will outline the role of nanofillers in modifying various properties of the polymer matrix, such as the mechanical strength, the refractive index and their performance during lithography. Also, we will discuss the lithographic techniques employed for transferring 2D patterns and 3D shapes with high spatial resolution. The capabilities of nanocomposites to act as structural and functional materials in novel devices and selected applications in photonics, electronics, magnetism and bioscience will be presented. Finally, we will conclude with a discussion of the current trends in this field and perspectives for its development in the near future.

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Section: The Host Matrixmentioning

confidence: 99%

Recent Advances on Nanocomposite Resists With Design Functionality for Lithographic Microfabrication

et al. 2021

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“…UV photopolymerization is the most commonly practiced method; applications include thin films, coatings, paints, printer inks, biomedicine, electronics and photoresist nanofabrication. [1][2][3][4][5][6] UV initiated photo-polymerization has been applied to thin film manufacturing due to its rapid production rate, uniform crosslinking and products with low volatile content.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and photocrosslinking of disulfonated poly(arylene ether sulfone) copolymers for potential reverse osmosis membrane materials

Nebipasagil

Sundell

Lane

et al. 2016

Polymer

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Disulfonated poly(arylene ether sulfone) random copolymers with controlled oligomeric molecular weights were synthesized via nucleophilic aromatic substitution step polymerization. A monofunctional endcapping reagent, meta-aminophenol, was utilized to control the molecular weight of the oligomers and to install telechelic amine endgroups. The meta-aminophenol endcapped oligomers were reacted with acryloyl chloride to obtain novel crosslinkable poly(arylene ether sulfone) oligomers with acrylamide groups on both ends. The chemical compositions of the functional oligomers were characterized by 1 H NMR spectroscopy to determine the degree of sulfonation and concentrations of acrylamide endgroups. The acrylamide-terminated oligomers were crosslinked with UV radiation in the presence of a multifunctional acrylate and a UV photoinitiator. Transparent, free-standing, dense films were obtained with high gel fractions. FTIR spectroscopy was utilized to observe the progress of the photo-crosslinking reaction. Thin films were cast from either aqueous or water-methanol solutions. The crosslinked disulfonated poly(arylene ether sulfone) networks exhibited reduced water uptake and swelling relative to their linear counterparts. SEM and AFM showed that the photo-crosslinked thin films had smooth surfaces.

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Multi‐stimuli‐responsive Polymers Based on Calix[4]arenes and Dibenzo‐18‐crown‐6‐ethers

Wiktorowicz

Tenhu

Aseyev

2018

Temperature‐Responsive Polymers

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Photoresists and Advanced Patterning

Cited by 4 publications

References 141 publications

Recent Advances on Nanocomposite Resists With Design Functionality for Lithographic Microfabrication

Recent Advances on Nanocomposite Resists With Design Functionality for Lithographic Microfabrication

Synthesis and photocrosslinking of disulfonated poly(arylene ether sulfone) copolymers for potential reverse osmosis membrane materials

Multi‐stimuli‐responsive Polymers Based on Calix[4]arenes and Dibenzo‐18‐crown‐6‐ethers

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