Reversible photoacids have been widely used in different areas for control of proton-driven processes with light. Previously reported reversible photoacids rely on thermal relaxation to return to the low-acidity ground state. Herein we report a photoacid that can be switched between low-acidity and highacidity states by different wavelengths of light. The photoacid can be converted into a high-acidity metastable state by 470 nm irradiation. The thermal relaxation of the metastable state is very slow and its half-life in DMSO is 55 h. Irradiation with 365 nm light quickly induced the reverse reaction and reached a photostationary state. UV/Vis absorption spectra of the forward and reverse processes induced by 470 nm and 365 nm irradiation, respectively, have well-matched isosbestic points. No decomposition was observed after the photoacid was switched by the two wavelengths of light for many cycles. Reversible patterning with both writing and erasing steps performed with light was demonstrated using a polymer thin film containing the photoacid and chlorophenol red as the proton acceptor.