Photosensitive polymer: synthesis, characterization and properties of a polymer having pendant photocrosslinkable group

Subramanian, K. G.; Krishnasamy, V.; Nanjundan, S.; Reddy, A.V.R.

doi:10.1016/s0014-3057(00)00008-2

Cited by 50 publications

(32 citation statements)

References 20 publications

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“…CHMA was prepared from reaction of 3-cyclohexene-1-methanol (10.00 g, 0.0856 mol) with methacryloyl chloride (8.95 g, 0.0856 mol) in the presence of triethylamine (8.66 g, 0.0856 mol) in THF at 0-5°C range according to the usual method [17] (Scheme 1, first row). The precipitated triethylammonium chloride was filtered out of the mixture and the solvent in the filtrate was removed through a rotary evaporator.…”

Section: Synthesis Of Chma Monomermentioning

confidence: 99%

Copolymerization of cyclohexene-3-yl methyl methacrylate with styrene: synthesis, characterization, monomer reactivity ratios, and thermal properties

Barim

Yayla

Degirmenci

2014

Designed Monomers and Polymers

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A methacrylate monomer, cyclohexene-3-yl methyl methacrylate (CHMA) was synthesized by reaction of 3-cyclohexene-1-methanol with methacryloyl chloride in the presence of triethylamine at 0-5°C. The homopolymer of CHMA and its copolymer with styrene (St) were prepared by free radical polymerization. The Fourier transform infrared (FT-IR), 1 H NMR, and 13 C NMR spectroscopic techniques were used to characterize the homopolymers and copolymers.1 H NMR spectra were used to determine the compositions of the copolymers. Linearization methods such as Kelen-Tüdös, Extended Kelen-Tüdös, and a non-linear least squares method were all used to determine the reactivity ratios of the monomers. The effect of copolymer compositions on their thermal behavior was studied by differential thermal analysis and thermogravimetric analysis methods.

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Section: Synthesis Of Chma Monomermentioning

confidence: 99%

Copolymerization of cyclohexene-3-yl methyl methacrylate with styrene: synthesis, characterization, monomer reactivity ratios, and thermal properties

Barim

Yayla

Degirmenci

2014

Designed Monomers and Polymers

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“…Polyesters synthesized have been reported to possess intriguing anisotropic, mechanical, electrical and optical properties suitable for technological applications [14]. Photocrosslinkable polymers have found applications in microlithography including printing technology, integrated circuit technology, photoconductors, photofabrication, photocrosslinked hydrogels etc [15][16][17]. Kannappan et al [18] were investigated the rate of photocrosslinking behavior of random copolyesters with arylidene-keto moiety by UV spectral studies.…”

Section: Introductionmentioning

confidence: 99%

Synthesis, Characterization and Photocrosslinkable Studies of Certain Thermotropic Liquid Crystalline Poly(ester-amides)

Kalappa¹,

Antony²,

Ramalakshmi³

2018

JACS

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Five thermotropic liquid crystalline poly(ester-amides) were synthesized by polycondensation method using varying dicarboxylic acids with a common diamine namely 4,4'-diaminodiphenyl and a common diol namely 2,6-bis(4-hydroxy-3-methoxybenzylidene)cyclohexanone (CHBV). The solubility data and viscosity measurements of these synthesized poly(ester-amides) were used for qualitative characterization. The spectroscopic techniques such as FT-IR, 1 H NMR, 13 C NMR were performed for investigating micro structural features. By differential scanning calorimetry (DSC), the thermal phase transition behavior of these poly(ester-amides) was studied. Scanning electron microscopy (SEM) technique was used to investigate the morphology of these poly(ester-amides). By using UV-visible spectroscopic technique, the photocrosslinkability of these poly(ester-amides) were studied by irradiating these poly(ester-amides) under a 160 W medium pressure mercury lamp. SEM analysis of these UV irradiated poly(ester-amides) showed the changes in morphology. Thus, the poly(esteramides) containing arylidene keto moiety in the main chain exhibited nematic mesophase and were photocrosslinked upon UV irradiation. X-ray diffraction (XRD) patterns of these poly(ester-amides) were taken to assess the degree of crystallinity.

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“…In addition, because curing of resin is a quick process, some thickness measurement methods based on a scanning probe that require a certain sweep time cannot be used. Other measurement methods like FTIR (Fourier transform infrared spectroscopy) [25,26], differential scanning calorimetry (DSC) and Raman spectroscopy [27,28] have been frequently used to monitor the curing process of resin; however, these methods are hard to obtain spatial information of the cured resin and therefore cannot meet the demands of thickness measurement. Differential interference contrast (DIC) microscopy has a theoretical potential to measure the thickness of cured resin in EWNSL, but it is hard to be applied as the in-process measurement in realistic productions.…”

Section: Introductionmentioning

confidence: 99%

In-Process Measurement of Thickness of Cured Resin in Evanescent-Wave-Based Nano-stereolithography Using Critical Angle Reflection

et al. 2018

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Stereolithography is one of the most powerful ways to fabricate complex three-dimensional polymeric-based structures layer-by-layer using optical power. Evanescent-wave-based nano-stereolithography using ultra-thin field distribution of evanescent wave to solidify photosensitive resin can provide a sub-micrometer vertical resolution of each layer. To meet strong demands for in-process thickness measurement of cured resin in evanescent-wave-based nano-stereolithography, a measurement method that utilizes variations of resin's refractive index after polymerization and a high sensitivity of total internal reflection at the critical angle has been proposed. By launching the a measurement light from a substrate to resin at the critical angle and detecting reflections from the resin, slight change in refractive index and thickness of cured resin that have great influences on reflectivity can be in-process measured. This method has been firstly examined by simulation using the rigorous coupled wave analysis method. Here, we show that an increase in cured resin's thickness induces a decrease in the reflectivity. In experiments, the largest reflectivity contrast between cured and uncured resins has been proved at the critical angle. In addition, the relationship between reflectivity drop and thickness has been calibrated and a linear relationship within a certain thickness range has been experimentally confirmed. Furthermore, the difference of curing process between continuous and discontinuous exposure has been investigated by using the proposed measurement method. At last, image subtraction and a median filter have been applied in imaging processing to remove influences of uneven illumination and background noises.

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Photosensitive polymer: synthesis, characterization and properties of a polymer having pendant photocrosslinkable group

Cited by 50 publications

References 20 publications

Copolymerization of cyclohexene-3-yl methyl methacrylate with styrene: synthesis, characterization, monomer reactivity ratios, and thermal properties

Copolymerization of cyclohexene-3-yl methyl methacrylate with styrene: synthesis, characterization, monomer reactivity ratios, and thermal properties

Synthesis, Characterization and Photocrosslinkable Studies of Certain Thermotropic Liquid Crystalline Poly(ester-amides)

In-Process Measurement of Thickness of Cured Resin in Evanescent-Wave-Based Nano-stereolithography Using Critical Angle Reflection

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